EB

Eric J. Bergman

SE Semitool: 47 patents #4 of 141Top 3%
Applied Materials: 24 patents #504 of 7,310Top 7%
FH Fresenius Medical Care Holdings: 9 patents #63 of 397Top 20%
VA Varian Semiconductor Equipment Associates: 1 patents #304 of 513Top 60%
📍 Kalispell, MT: #5 of 262 inventorsTop 2%
🗺 Montana: #8 of 3,198 inventorsTop 1%
Overall (All Time): #20,829 of 4,157,543Top 1%
83
Patents All Time

Issued Patents All Time

Showing 51–75 of 83 patents

Patent #TitleCo-InventorsDate
6701941 Method for treating the surface of a workpiece Mignon P. Hess 2004-03-09
6691720 Multi-process system with pivoting process chamber Dana Scranton, Eric Lund, Gil Lund 2004-02-17
6668844 Systems and methods for processing workpieces Eric Lund, Joe Lanfrankie, Gil Lund, Dana Scranton 2003-12-30
6601594 Apparatus and method for delivering a treatment liquid and ozone to treat the surface of a workpiece Mignon P. Hess 2003-08-05
6591845 Apparatus and method for processing the surface of a workpiece with ozone Mignon P. Hess 2003-07-15
6582525 Methods for processing a workpiece using steam and ozone 2003-06-24
6543156 Method and apparatus for high-pressure wafer processing and drying Ian Sharp, Craig P. Meuchel, H. Frederick Woods 2003-04-08
6497768 Process for treating a workpiece with hydrofluoric acid and ozone 2002-12-24
6488038 Method for cleaning semiconductor substrates Craig P. Meuchel, Ian Sharp 2002-12-03
6427359 Systems and methods for processing workpieces Dana Scranton, Eric Lund, Gil Lund 2002-08-06
6401732 Thermocapillary dryer 2002-06-11
6357142 Method and apparatus for high-pressure wafer processing and drying Ian Sharp, Craig P. Meuchel, H. Frederick Woods 2002-03-19
6319841 Semiconductor processing using vapor mixtures Robert W. Berner, David Oberlitner 2001-11-20
6286231 Method and apparatus for high-pressure wafer processing and drying Ian Sharp, Craig P. Meuchel, H. Frederick Woods 2001-09-11
6273108 Apparatus and method for processing the surface of a workpiece with ozone Mignon P. Hess 2001-08-14
6267125 Apparatus and method for processing the surface of a workpiece with ozone Mignon P. Hess 2001-07-31
6240933 Methods for cleaning semiconductor surfaces 2001-06-05
6199298 Vapor assisted rotary drying method and apparatus 2001-03-13
6192600 Thermocapillary dryer 2001-02-27
6162734 Semiconductor processing using vapor mixtures Robert W. Berner, David Oberlitner 2000-12-19
6022484 Semiconductor processor with wafer face protection Martin Bleck, Timothy J. Reardon 2000-02-08
5954911 Semiconductor processing using vapor mixtures Robert W. Berner, David Oberlitner 1999-09-21
5762751 Semiconductor processor with wafer face protection Martin Bleck, Timothy J. Reardon 1998-06-09
5584310 Semiconductor processing with non-jetting fluid stream discharge array Thomas H. Oberlitner 1996-12-17
5500081 Dynamic semiconductor wafer processing using homogeneous chemical vapors 1996-03-19