Issued Patents All Time
Showing 26–50 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4870452 | Projection exposure apparatus | Issei Tanaka, Akira Miyaji | 1989-09-26 |
| 4860374 | Apparatus for detecting position of reference pattern | Seiro Murakami, Susumu Makinouchi, Hidemi Kawai, Masaichi Murakami | 1989-08-22 |
| 4853745 | Exposure apparatus | Saburo Kamiya, Kazuaki Suzuki | 1989-08-01 |
| 4820899 | Laser beam working system | Ikuo Hikima, Akira Miyaji, Saburo Kamiya | 1989-04-11 |
| 4801977 | Projection optical apparatus | Shoji Ishizaka, Hideo Mizutani, Susumu Makinouchi | 1989-01-31 |
| RE32795 | Exposure apparatus for production of integrated circuit | Toshio Matsuura, Kyoichi Suwa, Hisayuki Shimizu | 1988-12-06 |
| 4776693 | Foreign substance inspecting system including a calibration standard | Kazunori Imamura, Yukio Kakizaki | 1988-10-11 |
| 4769523 | Laser processing apparatus | Keiichiro Sakato, Joji Iwamoto, Hiroshi Shirasu, Kiyoto Mashima | 1988-09-06 |
| 4761561 | Laser beam scanning pattern generation system with positional and dimensional error correction | Yoshihisa Fujiwara, Hisakazu Kato, Manabu Hosoya, Shinji Miura, Fuyuhiko Inoue +1 more | 1988-08-02 |
| 4730900 | Projection optical apparatus | Makoto Uehara, Hideo Mizutani, Kiyoyuki Muramatsu, Takeshi Asami | 1988-03-15 |
| 4711567 | Exposure apparatus | — | 1987-12-08 |
| 4702606 | Position detecting system | Toshio Matsuura, Seiro Murakami, Yuji Imai, Kazuya Ohta | 1987-10-27 |
| 4701606 | Projection optical apparatus | Shoji Ishizaka | 1987-10-20 |
| 4699515 | Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween | Toshio Matsuura, Kyoichi Suwa | 1987-10-13 |
| 4690528 | Projection exposure apparatus | Kazunori Imamura | 1987-09-01 |
| 4687322 | Projection optical apparatus | Shoji Ishizaka, Yutaka Endo, Hiroyuki Suzuki, Masamitsu Yanagihara | 1987-08-18 |
| 4685805 | Small gap measuring apparatus | Kenichi Kodama, Hisao Izawa, Yoichi Hamashima, Junji Hazama | 1987-08-11 |
| 4677301 | Alignment apparatus | Toshio Matsuura, Seiro Murakami, Makoto Uehara, Kyoichi Suwa | 1987-06-30 |
| 4636626 | Apparatus for aligning mask and wafer used in semiconductor circuit element fabrication | Junji Hazama, Kinya Kato, Hisao Izawa | 1987-01-13 |
| 4629313 | Exposure apparatus | — | 1986-12-16 |
| 4610541 | Foreign substance inspecting apparatus | Kazunori Imamura | 1986-09-09 |
| 4586822 | Inspecting method for mask for producing semiconductor device | — | 1986-05-06 |
| 4568835 | Apparatus for detecting foreign matters on a planar substrate | Kazunori Imamura, Nobutoshi Abe | 1986-02-04 |
| 4468120 | Foreign substance inspecting apparatus | Kazunori Imamura | 1984-08-28 |
| 4465368 | Exposure apparatus for production of integrated circuit | Toshio Matsuura, Kyoichi Suwa, Hisayuki Shimizu | 1984-08-14 |