| 7876452 |
Interferometric position-measuring devices and methods |
Michael Sogard, Bausan Yuan, Masahiko Okumura, Yosuke Shirata, Kiyoshi Uchikawa +1 more |
2011-01-25 |
| 7471372 |
Exposure apparatus and production method of device using the same |
— |
2008-12-30 |
| 7283200 |
System and method for measuring displacement of a stage |
Alex Ka Tim Poon, Leonard Wai Fung Kho, Toru Kawaguchi, Hisashi Tazawa, Yasuhiro Hidaka |
2007-10-16 |
| 6897963 |
Stage device and exposure apparatus |
Tetsuo Taniguchi |
2005-05-24 |
| 6784972 |
Exposure apparatus, device manufacturing method and environmental control method of exposure apparatus |
Yoshitomo Nagahashi, Koichi Katsura |
2004-08-31 |
| 6741358 |
Exposure apparatus and device production method in which position of reference plate provided on substrate stage is measured |
— |
2004-05-25 |
| 6714278 |
Exposure apparatus |
— |
2004-03-30 |
| 6710854 |
Projection exposure apparatus |
Naomasa Shiraishi, Yuji Kudo |
2004-03-23 |
| 6377336 |
Projection exposure apparatus |
Naomasa Shiraishi, Yuji Kudo |
2002-04-23 |
| 6002987 |
Methods to control the environment and exposure apparatus |
Naoyuki Kobayashi |
1999-12-14 |
| 5790253 |
Method and apparatus for correcting linearity errors of a moving mirror and stage |
— |
1998-08-04 |
| 5719704 |
Projection exposure apparatus |
Naomasa Shiraishi, Yuji Kudo |
1998-02-17 |
| 5563683 |
Substrate holder |
— |
1996-10-08 |
| 5550633 |
Optical measuring apparatus having a partitioning wall for dividing gas flow in an environmental chamber |
— |
1996-08-27 |
| 5392120 |
Dual interferometer measuring system including a wavelength correction resulting from a variation in the refractive index |
— |
1995-02-21 |
| 5272501 |
Projection exposure apparatus |
Kenji Nishi, Naomasa Shiraishi |
1993-12-21 |
| 5151749 |
Method of and apparatus for measuring coordinate position and positioning an object |
Akikazu Tanimoto |
1992-09-29 |
| 5018848 |
Laser beam transmitting apparatus |
Akikazu Tanimoto |
1991-05-28 |
| 4989031 |
Projection exposure apparatus |
— |
1991-01-29 |
| 4902900 |
Device for detecting the levelling of the surface of an object |
Hideo Mizutani |
1990-02-20 |
| 4853745 |
Exposure apparatus |
Kazuaki Suzuki, Akikazu Tanimoto |
1989-08-01 |
| 4820899 |
Laser beam working system |
Ikuo Hikima, Akira Miyaji, Akikazu Tanimoto |
1989-04-11 |