Issued Patents All Time
Showing 126–150 of 189 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6274498 | Methods of forming materials within openings, and method of forming isolation regions | John T. Moore | 2001-08-14 |
| 6274897 | Semiconductor structure having interconnects on a projecting region and substrate | Scott Meikle, Sung-Cheol Kim, Kirk D. Prall | 2001-08-14 |
| 6251802 | Methods of forming carbon-containing layers | John T. Moore, Scott DeBoer | 2001-06-26 |
| 6237483 | Global planarization method and apparatus | — | 2001-05-29 |
| 6232219 | Self-limiting method of reducing contamination in a contact opening, method of making contacts and semiconductor devices therewith, and resulting structures | Bradley J. Howard | 2001-05-15 |
| 6228772 | Method of removing surface defects or other recesses during the formation of a semiconductor device | Bradley J. Howard, Mark E. Jost | 2001-05-08 |
| 6222273 | System having vias including conductive spacers | Fernando Gonzalez | 2001-04-24 |
| 6221205 | Apparatus for improving the performance of a temperature-sensitive etch | Bradley J. Howard | 2001-04-24 |
| 6207571 | Self-aligned contact formation for semiconductor devices | Werner Juengling, Kirk D. Prall, Trung T. Doan, David Dickerson, David S. Becker | 2001-03-27 |
| 6184146 | Plasma producing tools, dual-source plasma etchers, dual-source plasma etching methods, and method of forming planar coil dual-source plasma etchers | Kevin G. Donohoe | 2001-02-06 |
| 6171964 | Method of forming a conductive spacer in a via | Fernando Gonzalez | 2001-01-09 |
| 6136720 | Plasma processing tools dual-source plasma etchers, dual-source plasma etching methods, and methods of forming planar coil dual-source plasma etchers | Kevin G. Donohoe | 2000-10-24 |
| 6136767 | Dilute composition cleaning method | Max Hineman | 2000-10-24 |
| 6136670 | Semiconductor processing methods of forming contacts between electrically conductive materials | Max Hineman | 2000-10-24 |
| 6132552 | Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor | Kevin G. Donohoe | 2000-10-17 |
| 6121671 | Semiconductor device having a substrate, an undoped silicon oxide structure, and an overlying doped silicon oxide structure with a side wall terminating at the undoped silicon oxide structure | Kei-Yu Ko, Li Li | 2000-09-19 |
| 6117791 | Etchant with selectivity for doped silicon dioxide over undoped silicon dioxide and silicon nitride, processes which employ the etchant, and structures formed thereby | Kei-Yu Ko, Li Li | 2000-09-12 |
| 6114252 | Plasma processing tools, dual-source plasma etchers, dual-source plasma etching methods, and methods of forming planar coil dual-source plasma etchers | Kevin G. Donohoe | 2000-09-05 |
| 6111264 | Small pores defined by a disposable internal spacer for use in chalcogenide memories | Graham R. Wolstenholme, Steven T. Harshfield, Raymond A. Turi, Fernando Gonzalez, Donwon Park | 2000-08-29 |
| 6095159 | Method of modifying an RF circuit of a plasma chamber to increase chamber life and process capabilities | Kevin G. Donohoe | 2000-08-01 |
| 6080672 | Self-aligned contact formation for semiconductor devices | Werner Juengling, Kirk D. Prall, Trung T. Doan, David Dickerson, David S. Becker | 2000-06-27 |
| 6080675 | Method for cleaning waste matter from the backside of a semiconductor wafer substrate | Kirk D. Prall | 2000-06-27 |
| 6074953 | Dual-source plasma etchers, dual-source plasma etching methods, and methods of forming planar coil dual-source plasma etchers | Kevin G. Donohoe | 2000-06-13 |
| 6066559 | Method for forming a semiconductor connection with a top surface having an enlarged recess | Fernando Gonzalez, Kirk D. Prall | 2000-05-23 |
| 6062133 | Global planarization method and apparatus | — | 2000-05-16 |