Issued Patents All Time
Showing 76–100 of 189 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6746317 | Methods and apparatuses for making and using planarizing pads for mechanical and chemical mechanical planarization of microelectronic substrates | — | 2004-06-08 |
| 6743724 | Planarization process for semiconductor substrates | Trung T. Doan, Mark Durcan, Scott Meikle | 2004-06-01 |
| 6713312 | Field emission tips and methods for fabricating the same | Sanh D. Tang, Zhaohui Huang | 2004-03-30 |
| 6693034 | Deadhesion method and mechanism for wafer processing | Hugh E. Stroupe, Brian F. Gordon | 2004-02-17 |
| 6683003 | Global planarization method and apparatus | — | 2004-01-27 |
| 6674158 | Semiconductor die package having a UV cured polymeric die coating | — | 2004-01-06 |
| 6656402 | Wafer planarization using a uniform layer of material and method for forming uniform layer of material used in semiconductor processing | Hugh E. Stroupe, Brian F. Gordon | 2003-12-02 |
| 6653722 | Method for applying uniform pressurized film across wafer | Hugh E. Stroupe, Lynn J. Carroll | 2003-11-25 |
| 6652764 | Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates | — | 2003-11-25 |
| 6645345 | Wafer planarization using a uniform layer of material and method and apparatus for forming uniform layer of material used in semiconductor processing | Hugh E. Stroupe, Brian F. Gordon | 2003-11-11 |
| 6624089 | Wafer planarization using a uniform layer of material and method and apparatus for forming uniform layer of material used in semiconductor processing | Hugh E. Stroupe, Brian F. Gordon | 2003-09-23 |
| 6617206 | Method of forming a capacitor structure | Gurtej S. Sandhu | 2003-09-09 |
| 6617256 | Method for controlling the temperature of a gas distribution plate in a process reactor | Kevin G. Donohoe | 2003-09-09 |
| 6613189 | Apparatus for controlling the temperature of a gas distribution plate in a process reactor | Kevin G. Donohoe | 2003-09-02 |
| 6596647 | Dilute cleaning composition and method for using the same | Max Hineman | 2003-07-22 |
| 6565721 | Use of heavy halogens for enhanced facet etching | Kevin G. Donohoe | 2003-05-20 |
| 6537922 | Etchant with selectivity for doped silicon dioxide over undoped silicon dioxide and silicon nitride, processes which employ the etchant, and structures formed thereby | Kei-Yu Ko, Li Li | 2003-03-25 |
| 6516742 | Apparatus for improved low pressure inductively coupled high density plasma reactor | Kevin G. Donohoe | 2003-02-11 |
| 6518172 | Method for applying uniform pressurized film across wafer | Hugh E. Stroupe, Lynn J. Carroll | 2003-02-11 |
| 6506679 | Deadhesion method and mechanism for wafer processing | Hugh E. Stroupe, Brian F. Gordon | 2003-01-14 |
| 6503410 | Method of modifying an RF circuit of a plasma chamber to increase chamber life and process capabilities | Kevin G. Donohoe | 2003-01-07 |
| 6501179 | Constructions comprising insulative materials | Werner Juengling, Kirk D. Prall, Ravi Iyer, Gurtej S. Sandhu | 2002-12-31 |
| 6475814 | Method for improved low pressure inductively coupled high density plasma reactor | Kevin G. Donohoe | 2002-11-05 |
| 6448656 | System including a memory device having a semiconductor connection with a top surface having an enlarged recess | Fernando Gonzalez, Kirk D. Prall | 2002-09-10 |
| 6429526 | Method for forming a semiconductor connection with a top surface having an enlarged recess | Kirk D. Prall, Fernando Gonzalez | 2002-08-06 |