GB

Guy T. Blalock

Micron: 189 patents #49 of 6,345Top 1%
📍 Boise, ID: #20 of 3,546 inventorsTop 1%
🗺 Idaho: #31 of 8,810 inventorsTop 1%
Overall (All Time): #3,824 of 4,157,543Top 1%
189
Patents All Time

Issued Patents All Time

Showing 76–100 of 189 patents

Patent #TitleCo-InventorsDate
6746317 Methods and apparatuses for making and using planarizing pads for mechanical and chemical mechanical planarization of microelectronic substrates 2004-06-08
6743724 Planarization process for semiconductor substrates Trung T. Doan, Mark Durcan, Scott Meikle 2004-06-01
6713312 Field emission tips and methods for fabricating the same Sanh D. Tang, Zhaohui Huang 2004-03-30
6693034 Deadhesion method and mechanism for wafer processing Hugh E. Stroupe, Brian F. Gordon 2004-02-17
6683003 Global planarization method and apparatus 2004-01-27
6674158 Semiconductor die package having a UV cured polymeric die coating 2004-01-06
6656402 Wafer planarization using a uniform layer of material and method for forming uniform layer of material used in semiconductor processing Hugh E. Stroupe, Brian F. Gordon 2003-12-02
6653722 Method for applying uniform pressurized film across wafer Hugh E. Stroupe, Lynn J. Carroll 2003-11-25
6652764 Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates 2003-11-25
6645345 Wafer planarization using a uniform layer of material and method and apparatus for forming uniform layer of material used in semiconductor processing Hugh E. Stroupe, Brian F. Gordon 2003-11-11
6624089 Wafer planarization using a uniform layer of material and method and apparatus for forming uniform layer of material used in semiconductor processing Hugh E. Stroupe, Brian F. Gordon 2003-09-23
6617206 Method of forming a capacitor structure Gurtej S. Sandhu 2003-09-09
6617256 Method for controlling the temperature of a gas distribution plate in a process reactor Kevin G. Donohoe 2003-09-09
6613189 Apparatus for controlling the temperature of a gas distribution plate in a process reactor Kevin G. Donohoe 2003-09-02
6596647 Dilute cleaning composition and method for using the same Max Hineman 2003-07-22
6565721 Use of heavy halogens for enhanced facet etching Kevin G. Donohoe 2003-05-20
6537922 Etchant with selectivity for doped silicon dioxide over undoped silicon dioxide and silicon nitride, processes which employ the etchant, and structures formed thereby Kei-Yu Ko, Li Li 2003-03-25
6516742 Apparatus for improved low pressure inductively coupled high density plasma reactor Kevin G. Donohoe 2003-02-11
6518172 Method for applying uniform pressurized film across wafer Hugh E. Stroupe, Lynn J. Carroll 2003-02-11
6506679 Deadhesion method and mechanism for wafer processing Hugh E. Stroupe, Brian F. Gordon 2003-01-14
6503410 Method of modifying an RF circuit of a plasma chamber to increase chamber life and process capabilities Kevin G. Donohoe 2003-01-07
6501179 Constructions comprising insulative materials Werner Juengling, Kirk D. Prall, Ravi Iyer, Gurtej S. Sandhu 2002-12-31
6475814 Method for improved low pressure inductively coupled high density plasma reactor Kevin G. Donohoe 2002-11-05
6448656 System including a memory device having a semiconductor connection with a top surface having an enlarged recess Fernando Gonzalez, Kirk D. Prall 2002-09-10
6429526 Method for forming a semiconductor connection with a top surface having an enlarged recess Kirk D. Prall, Fernando Gonzalez 2002-08-06