| 9076888 |
Silicided recessed silicon |
Hasan Nejad, Thomas A. Figura, Gordon A. Haller, John Mark Meldrim, Justin Harnish |
2015-07-07 |
$7,246,000 |
| 8420170 |
Methods of forming glass on a substrate |
Gurtej S. Sandhu |
2013-04-16 |
$3,647,000 |
| 8349687 |
Transistor gate forming methods and transistor structures |
Sanh D. Tang, Gordon A. Haller, Prashant Raghu |
2013-01-08 |
$3,201,000 |
| 8202806 |
Method to avoid threshold voltage shift in thicker dielectric films |
Randhir P. S. Thakur, Howard E. Rhodes |
2012-06-19 |
$4,808,000 |
| 8089128 |
Transistor gate forming methods and integrated circuits |
D. V. Nirmal Ramaswamy |
2012-01-03 |
$4,534,000 |
| 7977236 |
Method of forming a transistor gate of a recessed access device, method of forming a recessed transistor gate and a non-recessed transistor gate, and method of fabricating an integrated circuit |
Hasan Nejad, Thomas A. Figura, Gordon A. Haller, John Mark Meldrim, Justin Harnish |
2011-07-12 |
$2,990,000 |
| 7867845 |
Transistor gate forming methods and transistor structures |
Sanh D. Tang, Gordon A. Haller, Prashant Raghu |
2011-01-11 |
$3,670,000 |
| 7763327 |
Methods using ozone for CVD deposited films |
Gurtej S. Sandhu |
2010-07-27 |
$3,799,000 |
| 7659560 |
Transistor structures |
Sanh D. Tang, Gordon A. Haller, Prashant Raghu |
2010-02-09 |
$4,497,000 |
| 7642204 |
Methods of forming fluorine doped insulating materials |
Anand Srinivasan, Gurtej S. Sandhu |
2010-01-05 |
$5,811,000 |
| 7576400 |
Circuitry and gate stacks |
Zhiping Yin, Thomas R. Glass, Richard Holscher, Ardavan Niroomand, Linda K. Somerville +1 more |
2009-08-18 |
$5,074,000 |
| 7557032 |
Silicided recessed silicon |
Hasan Nejad, Thomas A. Figura, Gordon A. Haller, John Mark Meldrim, Justin Harnish |
2009-07-07 |
$2,670,000 |
| 7545009 |
Word lines for memory cells |
Yongjun Jeff Hu, Luan C. Tran, Brent Gilgen |
2009-06-09 |
$3,596,000 |
| 7538001 |
Transistor gate forming methods and integrated circuits |
D. V. Nirmal Ramaswamy |
2009-05-26 |
$2,939,000 |
| 7294893 |
Titanium silicide boride gate electrode |
— |
2007-11-13 |
$2,812,000 |
| 7268078 |
Chemical vapor deposition of titanium from titanium tetrachloride and hydrocarbon reactants |
Sujit Sharan |
2007-09-11 |
$1,295,000 |
| 7262503 |
Semiconductor constructions |
Werner Juengling, Kirk D. Prall, Gurtej S. Sandhu, Guy T. Blalock |
2007-08-28 |
$1,732,000 |
| 7214621 |
Methods of forming devices associated with semiconductor constructions |
Hasan Nejad, Gordon A. Haller, Thomas A. Figura |
2007-05-08 |
$1,698,000 |
| 7115492 |
Technique for elimination of pitting on silicon substrate during gate stack etch using material in a non-annealed state |
Pai-Hung Pan, Louie Liu |
2006-10-03 |
$1,273,000 |
| 7112542 |
Methods of forming materials between conductive electrical components, and insulating materials |
Werner Juengling, Kirk D. Prall, Gurtej S. Sandhu, Guy T. Blalock |
2006-09-26 |
$2,567,000 |
| 7109115 |
Methods of providing ohmic contact |
Yongjun Jeff Hu, Luan C. Tran, Brent Gilgen |
2006-09-19 |
$3,699,000 |
| 7101815 |
Method for improving thickness uniformity of deposited ozone-TEOS silicate glass layers |
— |
2006-09-05 |
$2,273,000 |
| 7078342 |
Method of forming a gate stack |
Pai-Hung Pan, Louie Liu |
2006-07-18 |
$2,294,000 |
| 7067442 |
Method to avoid threshold voltage shift in thicker dielectric films |
Randhir P. S. Thakur, Howard E. Rhodes |
2006-06-27 |
$1,742,000 |
| 7041548 |
Methods of forming a gate stack that is void of silicon clusters within a metallic silicide film thereof |
Pai-Hung Pan, Louie Liu |
2006-05-09 |
$2,283,000 |
