RI

Ravi Iyer

Micron: 130 patents #96 of 6,345Top 2%
📍 Boise, ID: #48 of 3,546 inventorsTop 2%
🗺 Idaho: #63 of 8,810 inventorsTop 1%
Overall (All Time): #8,446 of 4,157,543Top 1%
130
Patents All Time

Issued Patents All Time

Showing 26–50 of 130 patents

Patent #TitleCo-InventorsDate
7037829 Compound structure for reduced contact resistance Yongjun Jeff Hu, Luan C. Tran, Brent Gilgen 2006-05-02
7038318 Compound structure for reduced contact resistance Yongjun Jeff Hu, Luan C. Tran, Brent Gilgen 2006-05-02
6977225 Chemical vapor deposition of titanium from titanium tetrachloride and hydrocarbon reactants Sujit Sharan 2005-12-20
6952051 Interlevel dielectric structure Gurtej S. Sandhu, Anand Srinivasan 2005-10-04
6888212 Method for trench isolation by selective deposition of low temperature oxide films Gurtej S. Sandhu, Pai-Hung Pan 2005-05-03
6864561 Method and apparatus for reducing fixed charge in semiconductor device layers Randhir P. S. Thakur, Howard E. Rhodes 2005-03-08
6858526 Methods of forming materials between conductive electrical components, and insulating materials Werner Juengling, Kirk D. Prall, Gurtej S. Sandhu, Guy T. Blalock 2005-02-22
6841463 Interlevel dielectric structure and method of forming same Gurtej S. Sandhu, Anand Srinivasan 2005-01-11
6822303 Titanium boride gate electrode and interconnect 2004-11-23
6822328 Integrated circuitry Gurtej S. Sandhu 2004-11-23
6815374 Method for improving thickness uniformity of deposited ozone-TEOS silicate glass layers 2004-11-09
6812160 Methods of forming materials between conductive electrical components, and insulating materials Werner Juengling, Kirk D. Prall, Gurtej S. Sandhu, Guy T. Blalock 2004-11-02
6809025 Method of making a void-free aluminum film Gurtej S. Sandhu 2004-10-26
6784122 Method for improving thickness uniformity of deposited ozone-TEOS silicate glass layers 2004-08-31
6777346 Planarization using plasma oxidized amorphous silicon 2004-08-17
6727190 Method of forming fluorine doped boron-phosphorous silicate glass (F-BPSG) insulating materials Anand Srinivasan, Gurtej S. Sandhu 2004-04-27
6688584 Compound structure for reduced contact resistance Yongjun Jeff Hu, Luan C. Tran, Brent Gilgen 2004-02-10
6667540 Method and apparatus for reducing fixed charge in semiconductor device layers Randhir P. S. Thakur, Howard E. Rhodes 2003-12-23
6653234 Chemical vapor deposition of titanium from titanium tetrachloride and hydrocarbon reactants Sujit Sharan 2003-11-25
6639319 Conductive structure in an integrated circuit Jigish Trivedi 2003-10-28
6617246 Semiconductor processing methods and integrated circuitry Gurtej S. Sandhu 2003-09-09
6613673 Technique for elimination of pitting on silicon substrate during gate stack etch Pai-Hung Pan, Louie Liu 2003-09-02
6605502 Isolation using an antireflective coating Steven M. McDonald, Thomas R. Glass, Zhiping Yin 2003-08-12
6576570 Method for improving thickness uniformity of deposited ozone-teos silicate glass layers 2003-06-10
6570252 Integrated circuitry Gurtej S. Sandhu 2003-05-27