Issued Patents All Time
Showing 76–100 of 130 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6313046 | Method of forming materials between conductive electrical components, and insulating materials | Werner Juengling, Kirk D. Prall, Gurtej S. Sandhu, Guy T. Blalock | 2001-11-06 |
| 6297175 | Method for improving thickness uniformity of deposited ozone-TEOS silicate glass layers | — | 2001-10-02 |
| 6281101 | Process of forming metal silicide interconnects | — | 2001-08-28 |
| 6281100 | Semiconductor processing methods | Zhiping Yin, Thomas R. Glass, Richard Holscher, Ardavan Niroomand, Linda K. Somerville +1 more | 2001-08-28 |
| 6277737 | Semiconductor processing methods and integrated circuitry | Gurtej S. Sandhu | 2001-08-21 |
| 6255212 | Method of making a void-free aluminum film | Gurtej S. Sandhu | 2001-07-03 |
| 6251807 | Method for improving thickness uniformity of deposited ozone-teos silicate glass layers | — | 2001-06-26 |
| 6245631 | Method of forming buried bit line memory circuitry and semiconductor processing method of forming a conductive line | Vishnu K. Agarwal, Gurtej S. Sandhu | 2001-06-12 |
| 6204175 | Method of depositing a smooth conformal aluminum film on a refractory metal nitride layer | Gilbert Lai, Gurtej S. Sandhu, Brian A. Vaartstra | 2001-03-20 |
| 6201219 | Chamber and cleaning process therefor | Gurtej S. Sandhu, Donald L. Westmoreland | 2001-03-13 |
| 6194305 | Planarization using plasma oxidized amorphous silicon | — | 2001-02-27 |
| 6184136 | Chemical vapor deposition of titanium from titanium tetrachloride and hydrocarbon reactants | Sujit Sharan | 2001-02-06 |
| 6180449 | Depletion compensated polysilicon electrodes | Luan C. Tran, Charles L. Turner | 2001-01-30 |
| 6174590 | Isolation using an antireflective coating | Steven M. McDonald, Thomas R. Glass, Zhiping Yin | 2001-01-16 |
| 6162499 | Method of inhibiting deposition of material on an internal wall of a chemical vapor deposition reactor | Gurtej S. Sandhu, Donald L. Westmoreland | 2000-12-19 |
| 6156630 | Titanium boride gate electrode and interconnect and methods regarding same | — | 2000-12-05 |
| 6144098 | Techniques for improving adhesion of silicon dioxide to titanium | — | 2000-11-07 |
| 6121133 | Isolation using an antireflective coating | Steven M. McDonald, Thomas R. Glass, Zhiping Yin | 2000-09-19 |
| 6107183 | Method of forming an interlevel dielectric | Gurtej S. Sandhu, Anand Srinivasan | 2000-08-22 |
| 6107686 | Interlevel dielectric structure | Gurtej S. Sandhu, Anand Srinivasan | 2000-08-22 |
| 6107214 | Method for improving thickness uniformity of deposited ozone-TEOS silicate glass layers | — | 2000-08-22 |
| 6091150 | Integrated circuitry comprising electrically insulative material over interconnect line tops, sidewalls and bottoms | Gurtej S. Sandhu | 2000-07-18 |
| 6087254 | Technique for elimination of pitting on silicon substrate during gate stack etch | Pai-Hung Pan, Louie Liu | 2000-07-11 |
| 6085689 | Apparatus to increase gas residence time in a reactor | Gurtej S. Sandhu, Sujit Sharan | 2000-07-11 |
| 6066553 | Semiconductor processing method of forming electrically conductive interconnect lines and integrated circuitry | Gurtej S. Sandhu | 2000-05-23 |