Issued Patents All Time
Showing 101–125 of 130 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6046098 | Process of forming metal silicide interconnects | — | 2000-04-04 |
| 6039851 | Reactive sputter faceting of silicon dioxide to enhance gap fill of spaces between metal lines | — | 2000-03-21 |
| 6033992 | Method for etching metals using organohalide compounds | — | 2000-03-07 |
| 6001541 | Method of forming contact openings and contacts | — | 1999-12-14 |
| 5997639 | Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organometallic precursor compounds | — | 1999-12-07 |
| 5985770 | Method of depositing silicon oxides | Gurtej S. Sandhu | 1999-11-16 |
| 5981380 | Method of forming a local interconnect including selectively etched conductive layers and recess formation | Jigish Trivedi | 1999-11-09 |
| 5963835 | Method of forming aluminum film | Gurtej S. Sandhu | 1999-10-05 |
| 5946542 | Method of depositing passivation layers on semiconductor device arrays | — | 1999-08-31 |
| 5946594 | Chemical vapor deposition of titanium from titanium tetrachloride and hydrocarbon reactants | Sujit Sharan | 1999-08-31 |
| 5935336 | Apparatus to increase gas residence time in a reactor | Gurtej S. Sandhu, Sujit Sharan | 1999-08-10 |
| 5933760 | Method and apparatus for reducing fixed charge in semiconductor device layers | Randhir P. S. Thakur, Howard E. Rhodes | 1999-08-03 |
| 5917213 | Depletion compensated polysilicon electrodes | Luan C. Tran, Charles L. Turner | 1999-06-29 |
| 5913128 | Method for forming texturized polysilicon | — | 1999-06-15 |
| 5910684 | Integrated circuitry | Gurtej S. Sandhu | 1999-06-08 |
| 5872052 | Planarization using plasma oxidized amorphous silicon | — | 1999-02-16 |
| 5856236 | Method of depositing a smooth conformal aluminum film on a refractory metal nitride layer | Gilbert Lai, Gurtej S. Sandhu, Brian A. Vaartstra | 1999-01-05 |
| 5847463 | Local interconnect comprising titanium nitride barrier layer | Jigish Trivedi | 1998-12-08 |
| 5844318 | Aluminum film for semiconductive devices | Gurtej S. Sandhu | 1998-12-01 |
| 5824365 | Method of inhibiting deposition of material on an internal wall of a chemical vapor deposition reactor | Gurtej S. Sandhu, Donald L. Westmoreland | 1998-10-20 |
| 5817175 | Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organometallic precursor compounds | — | 1998-10-06 |
| 5736455 | Method for passivating the sidewalls of a tungsten word line | Pai-Hung Pan | 1998-04-07 |
| 5735960 | Apparatus and method to increase gas residence time in a reactor | Gurtej S. Sandhu, Sujit Sharan | 1998-04-07 |
| 5733816 | Method for depositing a tungsten layer on silicon | Irina Vasilyeva | 1998-03-31 |
| 5665644 | Semiconductor processing method of forming electrically conductive interconnect lines and integrated circuitry | Gurtej S. Sandhu | 1997-09-09 |