GB

Guy T. Blalock

Micron: 189 patents #49 of 6,345Top 1%
📍 Boise, ID: #20 of 3,546 inventorsTop 1%
🗺 Idaho: #31 of 8,810 inventorsTop 1%
Overall (All Time): #3,824 of 4,157,543Top 1%
189
Patents All Time

Issued Patents All Time

Showing 151–175 of 189 patents

Patent #TitleCo-InventorsDate
6056850 Apparatus for improving the performance of a temperature-sensitive etch process Bradley J. Howard 2000-05-02
6051502 Methods of forming conductive components and methods of forming conductive lines Harlan Frankamp 2000-04-18
6043151 Method for forming a semiconductor connection with a top surface having an enlarged recess Fernando Gonzalez, Kirk D. Prall 2000-03-28
6025271 Method of removing surface defects or other recesses during the formation of a semiconductor device Bradley J. Howard, Mark E. Jost 2000-02-15
RE36518 Method for making electrical contact with an active area through sub-micron contact openings and a semiconductor device Charles H. Dennison 2000-01-18
6015760 Method for enhancing oxide to nitride selectivity through the use of independent heat control David S. Becker, Fred L. Roe 2000-01-18
5997384 Method and apparatus for controlling planarizing characteristics in mechanical and chemical-mechanical planarization of microelectronic substrates 1999-12-07
5994220 Method for forming a semiconductor connection with a top surface having an enlarged recess Fernando Gonzalez, Kirk D. Prall 1999-11-30
5980688 Plasma reactors and method of cleaning a plasma reactor 1999-11-09
5967030 Global planarization method and apparatus 1999-10-19
5958796 Method for cleaning waste matter from the backside of a semiconductor wafer substrate Kirk D. Prall 1999-09-28
5945348 Method for reducing the heights of interconnects on a projecting region with a smaller reduction in the heights of other interconnects Scott Meikle, Sung-Cheol Kim, Kirk D. Prall 1999-08-31
5899749 In situ etch process for insulating and conductive materials David S. Becker 1999-05-04
5892285 Semiconductor connection with a top surface having an enlarged recess Fernando Gonzalez, Kirk D. Prall 1999-04-06
5880036 Method for enhancing oxide to nitride selectivity through the use of independent heat control David S. Becker, Lyle Breiner 1999-03-09
5814527 Method of making small pores defined by a disposable internal spacer for use in chalcogenide memories Graham R. Wolstenholme, Steven T. Harshfield, Raymond A. Turi, Fernando Gonzalez, Donwon Park 1998-09-29
5783100 Method of high density plasma etching for semiconductor manufacture Kevin G. Donohoe 1998-07-21
5779849 Plasma reactors and method of cleaning a plasma reactor 1998-07-14
5716873 Method for cleaning waste matter from the backside of a semiconductor wafer substrate Kirk D. Prall 1998-02-10
5711851 Process for improving the performance of a temperature-sensitive etch process Bradley J. Howard 1998-01-27
5691246 In situ etch process for insulating and conductive materials David S. Becker 1997-11-25
5647913 Plasma reactors 1997-07-15
5514246 Plasma reactors and method of cleaning a plasma reactor 1996-05-07
5438011 Method of forming a capacitor using a photoresist contact sidewall having standing wave ripples Bradley J. Howard 1995-08-01
5417826 Removal of carbon-based polymer residues with ozone, useful in the cleaning of plasma reactors 1995-05-23