| 7638436 |
Semiconductor processing methods of transferring patterns from patterned photoresists to materials |
John T. Moore |
2009-12-29 |
$8,543,000 |
| 7435688 |
Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride |
John T. Moore |
2008-10-14 |
$1,624,000 |
| 7410911 |
Method for stabilizing high pressure oxidation of a semiconductor device |
Daniel Gealy, Dave Chapek, Husam N. Al-Shareef, Randhir P. S. Thakur |
2008-08-12 |
$1,336,000 |
| 7345333 |
Double sided container process used during the manufacture of a semiconductor device |
Ronald A. Weimer, John T. Moore |
2008-03-18 |
$1,356,000 |
| 7282457 |
Apparatus for stabilizing high pressure oxidation of a semiconductor device |
Daniel Gealy, Dave Chapek, Husam N. Al-Shareef, Randhir P. S. Thakur |
2007-10-16 |
$1,318,000 |
| 7279435 |
Apparatus for stabilizing high pressure oxidation of a semiconductor device |
Daniel Gealy, Dave Chapek, Husam N. Al-Shareef, Randhir P. S. Thakur |
2007-10-09 |
$1,129,000 |
| 7268072 |
Method and structure for reducing contact aspect ratios |
Vishnu K. Agarwal |
2007-09-11 |
$1,295,000 |
| 7208805 |
Structures comprising a layer free of nitrogen between silicon nitride and photoresist |
John T. Moore |
2007-04-24 |
$2,014,000 |
| 7206215 |
Antifuse having tantalum oxynitride film and method for making same |
Husam N. Al-Shareef, Randhir P. S. Thakur, Dan Gealy |
2007-04-17 |
$2,089,000 |
| 7192889 |
Methods for forming a high dielectric film |
Randhir P. S. Thakur |
2007-03-20 |
$2,361,000 |
| 7176079 |
Method of fabricating a semiconductor device with a wet oxidation with steam process |
Ronald A. Weimer, Dan Gealy, Husam N. Al-Shareef |
2007-02-13 |
$2,321,000 |
| 7153746 |
Capacitors, methods of forming capacitors, and methods of forming capacitor dielectric layers |
John T. Moore |
2006-12-26 |
$1,821,000 |
| 7141850 |
Gated semiconductor assemblies and methods of forming gated semiconductor assemblies |
Mark A. Helm, Mark Fischer, John T. Moore |
2006-11-28 |
$4,082,000 |
| 7115926 |
Capacitor constructions, DRAM constructions, and semiconductive material assemblies |
John T. Moore, Guy T. Blalock |
2006-10-03 |
$1,273,000 |
| 7092233 |
Capacitor electrode having an interface layer of different chemical composition formed on a bulk layer |
Don Powell |
2006-08-15 |
$2,310,000 |
| 7084448 |
Double sided container process used during the manufacture of a semiconductor device |
Ronald A. Weimer, John T. Moore |
2006-08-01 |
$2,483,000 |
| 7078328 |
Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride |
John T. Moore |
2006-07-18 |
$2,294,000 |
| 7067411 |
Method to prevent metal oxide formation during polycide reoxidation |
Klaus Schuegraf, Randhir P. S. Thakur |
2006-06-27 |
$1,742,000 |
| 7064052 |
Method of processing a transistor gate dielectric film with stem |
Ronald A. Weimer, Dan Gealy, Husam N. Al-Shareef |
2006-06-20 |
$2,855,000 |
| 7057263 |
Semiconductor wafer assemblies comprising photoresist over silicon nitride materials |
John T. Moore, Mark Fischer, J. Brett Rolfson, Annette L. Martin, Ardavan Niroomand |
2006-06-06 |
$2,297,000 |
| 7045277 |
Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride |
John T. Moore |
2006-05-16 |
$2,554,000 |
| 7038265 |
Capacitor having tantalum oxynitride film and method for making same |
Husam N. Al-Shareef, Randhir P. S. Thakur, Dan Gealy |
2006-05-02 |
$2,317,000 |
| 7022623 |
Method of fabricating a semiconductor device with a dielectric film using a wet oxidation with steam process |
Ronald A. Weimer, Dan Gealy, Husam N. Al-Shareef |
2006-04-04 |
$2,376,000 |
| 7009264 |
Selective spacer to prevent metal oxide formation during polycide reoxidation |
Klaus Schuegraf, Randhir P. S. Thakur |
2006-03-07 |
$1,749,000 |
| 6964909 |
Method of forming a capacitor electrode having an interface layer of different chemical composition from a bulk layer |
Don Powell |
2005-11-15 |
$2,881,000 |