Issued Patents All Time
Showing 26–50 of 97 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE43659 | Method for making a design layout of a semiconductor integrated circuit | Satoshi Tanaka, Soichi Inoue | 2012-09-11 |
| 8196071 | Creating mask data of integrated circuit patterns using calculated etching conversion difference | Hiromitsu Mashita, Katsumi Iyanagi, Takafumi Taguchi, Hidefumi Mukai, Taiga Uno +1 more | 2012-06-05 |
| 8183148 | Method of fabricating semiconductor device and semiconductor device | Ryota Aburada, Hiromitsu Mashita, Chikaaki Kodama | 2012-05-22 |
| 8171433 | Method of calculating pattern-failure-occurrence-region, computer program product, pattern-layout evaluating method, and semiconductor-device manufacturing method | Masanori Takahashi, Satoshi Tanaka | 2012-05-01 |
| 8143171 | Method for manufacturing semiconductor device and computer readable medium for storing pattern size setting program | Hiromitsu Mashita, Fumiharu Nakajima, Takafumi Taguchi, Chikaaki Kodama | 2012-03-27 |
| 8146022 | Mask pattern data generation method, mask manufacturing method, semiconductor device manufacturing method, and pattern data generation program | Hiromitsu Mashita, Takashi Obara | 2012-03-27 |
| 8142961 | Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing method | Satoshi Tanaka, Shigeki Nojima, Koji Hashimoto, Soichi Inoue | 2012-03-27 |
| 8122385 | Mask pattern correcting method | Kazuya Fukuhara, Tatsuhiko Higashiki, Satoshi Tanaka, Takashi Sato, Akiko Mimotogi +1 more | 2012-02-21 |
| 8112167 | Process controller for semiconductor manufacturing, utilizing dangerous pattern identification and process capability determination | Ayako Endo, Kenji Yoshida, Satoshi Tanaka | 2012-02-07 |
| 8108824 | Pattern verification method, method of manufacturing semiconductor device, and recording media | Hiromitsu Mashita, Kazuhito Kobayashi | 2012-01-31 |
| 8101516 | Method of forming contact hole pattern in semiconductor integrated circuit device | Hiroko Nakamura, Koji Hashimoto | 2012-01-24 |
| 8078996 | Method and system for correcting a mask pattern design | Kyoko Izuha, Shigeki Nojima, Satoshi Tanaka | 2011-12-13 |
| 8065637 | Semiconductor device | — | 2011-11-22 |
| 8046722 | Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor device | Satoshi Tanaka, Soichi Inoue | 2011-10-25 |
| 8042067 | Pattern forming method and system, and method of manufacturing a semiconductor device | Ayako Nakano | 2011-10-18 |
| 7998642 | Mask pattern data creation method and mask | Chikaaki Kodama, Hirotaka Ichikawa, Kazuyuki Masukawa | 2011-08-16 |
| 7996794 | Mask data processing method for optimizing hierarchical structure | Sachiko Kobayashi, Shinichiroh Ohki, Hirotaka Ichikawa | 2011-08-09 |
| 7984390 | Data processing method in semiconductor device, program of the same, and manufacturing method of semiconductor device | Ayako Nakano, Atsushi Watanabe | 2011-07-19 |
| 7966584 | Pattern-producing method for semiconductor device | Suigen Kyoh, Soichi Inoue | 2011-06-21 |
| 7949967 | Design Pattern correcting method, process proximity effect correcting method, and semiconductor device manufacturing method | Shigeki Nojima, Shimon Maeda | 2011-05-24 |
| 7941767 | Photomask management method and photomask wash limit generating method | Hidefumi Mukai, Shinji Yamaguchi, Yukiyasu Arisawa | 2011-05-10 |
| 7934175 | Parameter adjustment method, semiconductor device manufacturing method, and recording medium | Yasunobu Kai, Soichi Inoue, Satoshi Tanaka, Shigeki Nojima, Kazuyuki Masukawa +1 more | 2011-04-26 |
| RE42302 | Method for making a design layout and mask | Satoshi Tanaka, Soichi Inoue | 2011-04-19 |
| 7925090 | Method of determining photo mask, method of manufacturing semiconductor device, and computer program product | Kazuya Fukuhara, Kyoko Izuha | 2011-04-12 |
| RE42294 | Semiconductor integrated circuit designing method and system using a design rule modification | Satoshi Tanaka, Soichi Inoue | 2011-04-12 |