Issued Patents All Time
Showing 76–97 of 97 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7426712 | Lithography simulation method and recording medium | Shigeki Nojima, Shoji Mimotogi | 2008-09-16 |
| 7402363 | Pattern forming method and system, and method of manufacturing a semiconductor device | Ayako Nakano | 2008-07-22 |
| 7370314 | Method and program for generating layout data of a semiconductor integrated circuit and method for manufacturing a semiconductor integrated circuit with optical proximity correction | Fumihiro Minami | 2008-05-06 |
| 7337426 | Pattern correcting method, mask making method, method of manufacturing semiconductor device, pattern correction system, and computer-readable recording medium having pattern correction program recorded therein | Shigeki Nojima, Kazuhito Kobayashi | 2008-02-26 |
| 7266801 | Design pattern correction method and mask pattern producing method | Suigen Kyoh, Hirotaka Ichikawa | 2007-09-04 |
| 7213226 | Pattern dimension correction method and verification method using OPC, mask and semiconductor device fabricated by using the correction method, and system and software product for executing the correction method | Shigeki Nojima | 2007-05-01 |
| 7200833 | Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method | Kyoko Izuha, Satoshi Tanaka | 2007-04-03 |
| 7194704 | Design layout preparing method | Shigeki Nojima, Suigen Kyoh, Kyoko Izuha, Ryuji Ogawa, Satoshi Tanaka +2 more | 2007-03-20 |
| 7181707 | Method of setting process parameter and method of setting process parameter and/or design rule | Satoshi Tanaka, Koji Hashimoto, Soichi Inoue, Ichiro Mori | 2007-02-20 |
| 7120882 | Method of setting process parameter and method of setting process parameter and/or design rule | Satoshi Tanaka, Koji Hashimoto, Soichi Inoue, Ichiro Mori | 2006-10-10 |
| 7090949 | Method of manufacturing a photo mask and method of manufacturing a semiconductor device | Shigeki Nojima, Shoji Mimotogi, Satoshi Tanaka, Shigeru Hasebe, Koji Hashimoto +2 more | 2006-08-15 |
| 7065739 | Pattern correction method of semiconductor device | Sachiko Kobayashi, Satoshi Tanaka, Susumu Watanabe, Mitsuhiro Yano | 2006-06-20 |
| 6964031 | Mask pattern generating method and manufacturing method of semiconductor apparatus | Satoshi Tanaka, Soichi Inoue, Sachiko Kobayashi, Hirotaka Ichiakwa | 2005-11-08 |
| 6907596 | Mask data generating apparatus, a computer implemented method for generating mask data and a computer program for controlling the mask data generating apparatus | Sachiko Kobayashi, Satoshi Tanaka, Susumu Watanabe | 2005-06-14 |
| 6901577 | Pattern forming method and semiconductor device manufactured by using said pattern forming method | Satoshi Tanaka, Soichi Inoue | 2005-05-31 |
| 6853743 | Mask pattern correction method, mask pattern creation system using the correction method, and computer-readable recording medium | Satoshi Tanaka, Soichi Inoue | 2005-02-08 |
| 6727028 | Pattern formation method, mask for exposure used for pattern formation, and method of manufacturing the same | Satoshi Tanaka, Soichi Inoue | 2004-04-27 |
| 6507931 | Semiconductor integrated circuit designing method and system | Satoshi Tanaka, Soichi Inoue | 2003-01-14 |
| 6249900 | Method of designing an LSI pattern to be formed on a specimen with a bent portion | Shoji Mimotogi, Soichi Inoue, Kazuko Yamamoto | 2001-06-19 |
| 6245466 | Mask pattern design method and a photomask | Satoshi Tanaka, Soichi Inoue | 2001-06-12 |
| 6221539 | Mask pattern correction method and a recording medium which records a mask pattern correction program | Satoshi Tanaka, Soichi Inoue | 2001-04-24 |
| 6180293 | Mask pattern preparing method and photomask | Satoshi Tanaka, Soichi Inoue | 2001-01-30 |