Issued Patents All Time
Showing 51–75 of 137 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7494931 | Method for fabricating semiconductor device and polishing method | Dai Fukushima, Gaku Minamihaba, Nobuyuki Kurashima, Susumu Yamamoto | 2009-02-24 |
| 7465668 | Method of manufacturing semiconductor device | Dai Fukushima, Gaku Minamihaba | 2008-12-16 |
| 7459398 | Slurry for CMP, polishing method and method of manufacturing semiconductor device | Gaku Minamihaba, Yukiteru Matsui | 2008-12-02 |
| 7455901 | Fiber-reinforced composite material, method for manufacturing the same and applications thereof | Junji Sugiyama, Masaya Nogi, Shin-ichiro Iwamoto, Keishin Handa, Akira Nagai +7 more | 2008-11-25 |
| 7452819 | Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device | Yukiteru Matsui, Gaku Minamihaba, Yoshikuni Tateyama, Atsushi Shigeta | 2008-11-18 |
| 7435682 | Method of manufacturing semiconductor device | Yukiteru Matsui, Gaku Minamihaba, Atsushi Shigeta, Satoko Seta, Hirokazu Kato | 2008-10-14 |
| 7419420 | Substrate holding mechanism, substrate polishing apparatus and substrate polishing method | Tetsuji Togawa, Toshio Watanabe, Gen Toyota, Kenji Iwade, Yoshikuni Tateyama | 2008-09-02 |
| 7419910 | Slurry for CMP, polishing method and method of manufacturing semiconductor device | Gaku Minamihaba, Dai Fukushima, Susumu Yamamoto | 2008-09-02 |
| 7416942 | Method for manufacturing semiconductor device | Yukiteru Matsui, Shinichi Hirasawa, Atsushi Shigeta, Kiyotaka Miyano, Takeshi Nishioka | 2008-08-26 |
| 7402521 | Method for chemically mechanically polishing organic film, method of manufacturing semiconductor device, and program therefor | Yukiteru Matsui, Gaku Minamihaba, Atsushi Shigeta | 2008-07-22 |
| 7378149 | High strength material using cellulose microfibrils | Susumu Nakahara | 2008-05-27 |
| 7364667 | Slurry for CMP and CMP method | Gaku Minamihaba | 2008-04-29 |
| 7332104 | Slurry for CMP, polishing method and method of manufacturing semiconductor device | Gaku Minamihaba, Yukiteru Matsui | 2008-02-19 |
| 7307344 | Semiconductor device including a discontinuous film and method for manufacturing the same | Gaku Minamihaba, Nobuyuki Kurashima, Susumu Yamamoto | 2007-12-11 |
| 7307023 | Polishing method of Cu film and method for manufacturing semiconductor device | Dai Fukushima, Gaku Minamihaba, Susumu Yamamoto | 2007-12-11 |
| 7291057 | Apparatus for polishing a substrate | Norio Kimura, Yu Ishii, Hirokuni Hiyama, Katsuya Okumura | 2007-11-06 |
| 7241205 | Method of processing a substrate | Gen Toyota, Atsushi Shigeta | 2007-07-10 |
| 7217662 | Method of processing a substrate | Gen Toyota, Atsushi Shigeta | 2007-05-15 |
| 7198729 | CMP slurry and method of manufacturing semiconductor device | Nobuyuki Kurashima, Gaku Minamihaba | 2007-04-03 |
| 7166017 | Slurry for CMP, polishing method and method of manufacturing semiconductor device | Gaku Minamihaba, Yukiteru Matsui | 2007-01-23 |
| 7144804 | Semiconductor device and method of manufacturing the same | Gaku Minamihaba, Dai Fukushima, Yoshikuni Tateyama | 2006-12-05 |
| 7138073 | Slurry for chemical mechanical polishing for copper and method of manufacturing semiconductor device using the slurry | Gaku Minamihaba | 2006-11-21 |
| 7108589 | Polishing apparatus and method | Norio Kimura, Mitsuhiko Shirakashi, Katsuya Okumura, You Ishii, Junji Kunisawa | 2006-09-19 |
| 7071108 | Chemical mechanical polishing slurry containing abrasive particles exhibiting photocatalytic function | Yukiteru Matsui, Gaku Minamihaba | 2006-07-04 |
| 7060621 | Slurry for CMP, polishing method and method of manufacturing semiconductor device | Gaku Minamihaba, Yukiteru Matsui | 2006-06-13 |