RY

Ryoichi Yoshikawa

NT Nuflare Technology: 18 patents #18 of 298Top 7%
Canon: 13 patents #5,080 of 19,416Top 30%
TO Toshiba: 4 patents #258 of 2,688Top 10%
KT Kabushiki Kaisha Toshiba: 4 patents #6,684 of 21,451Top 35%
TC Toshiba Machine Co.: 1 patents #70 of 186Top 40%
NT Ntt Advanced Technology: 1 patents #43 of 188Top 25%
SO Sony: 1 patents #17,262 of 25,231Top 70%
Overall (All Time): #79,619 of 4,157,543Top 2%
40
Patents All Time

Issued Patents All Time

Showing 1–25 of 40 patents

Patent #TitleCo-InventorsDate
10796882 Charged particle beam writing apparatus and charged particle beam writing method Hideo Inoue 2020-10-06
10784080 Multiple charged particle beam writing apparatus, and multiple charged particle beam writing method Hideo Inoue 2020-09-22
RE47561 Multi charged particle beam writing method and multi charged particle beam writing apparatus Munehiro Ogasawara 2019-08-06
10020159 Multi charged particle beam writing method and multi charged particle beam writing apparatus Hiroshi Matsumoto, Tomohiro Iijima, Munehiro Ogasawara, Hideo Inoue 2018-07-10
9934935 Multi charged particle beam writing apparatus and multi charged particle beam writing method Hideo Inoue, Hayato Kimura, Yasuo Kato, Jun Yashima 2018-04-03
9805905 Blanking device for multi-beam of charged particle writing apparatus using multi-beam of charged particle and defective beam blocking method for multi-beam of charged particle Hiroshi Yamashita, Kazuhiro Chiba, Hiroshi Matsumoto 2017-10-31
9691585 Multi charged particle beam writing method, and multi charged particle beam writing apparatus Hiroshi Matsumoto, Munehiro Ogasawara 2017-06-27
9570267 Multi charged particle beam writing method and multi charged particle beam writing apparatus Hiroshi Matsumoto, Tomohiro Iijima, Munehiro Ogasawara, Hideo Inoue 2017-02-14
9530610 Blanking aperture array device for multi-beams, and fabrication method of blanking aperture array device for multi-beams Kazuhiro Chiba, Hiroshi Matsumoto, Munehiro Ogasawara, Hirofumi Morita, Hirokazu Yamada +6 more 2016-12-27
9343268 Multi charged particle beam writing apparatus and multi charged particle beam writing method Munehiro Ogasawara 2016-05-17
9287090 Multi charged particle beam writing apparatus, and multi charged particle beam writing method Hiroshi Matsumoto 2016-03-15
9202673 Multi charged particle beam writing method and multi charged particle beam writing apparatus Hiroshi Matsumoto, Tomohiro Iijima, Munehiro Ogasawara, Hideo Inoue 2015-12-01
9076564 Multi charged particle beam writing apparatus and multi charged particle beam writing method Munehiro Ogasawara 2015-07-07
8907306 Multi charged particle beam writing apparatus and multi charged particle beam writing method Munehiro Ogasawara 2014-12-09
8741547 Multi charged particle beam writing apparatus and multi charged particle beam writing method Munehiro Ogasawara 2014-06-03
8729507 Multi charged particle beam writing method and multi charged particle beam writing apparatus Muehiro Ogasawara 2014-05-20
8710467 Multi charged particle beam writing apparatus and multi charged particle beam writing method Munehiro Ogasawara 2014-04-29
8586951 Multi charged particle beam writing apparatus and multi charged particle beam writing method Munehiro Ogasawara 2013-11-19
7878060 Motion sensor and method of manufacturing the same 2011-02-01
5760410 Electron beam lithography apparatus and method Kazuto Matsuki, Shuichi Tamamushi, Toshio Yamaguchi 1998-06-02
5404410 Method and system for generating a bit pattern Toru Tojo, Hideo Tsuchiya, Kyoji Yamashita, Mitsuo Tabata 1995-04-04
5185812 Optical pattern inspection system Kyoji Yamashita, Masakazu Tokita 1993-02-09
4656466 Electro-optic display device Masaaki Yoshida, Naoki Nagase, Masanori Yamada 1987-04-07
4647782 Charged particle beam exposure apparatus Hirotsugu Wada, Shunichi Sano, Mamoru Nakasuji 1987-03-03
4623256 Apparatus for inspecting mask used for manufacturing integrated circuits Osamu Ikenaga 1986-11-18