Issued Patents All Time
Showing 25 most recent of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9875936 | Spacer defined fin growth and differential fin width | Ryan Sporer, Jeremy A. Wahl | 2018-01-23 |
| 9455201 | Integration method for fabrication of metal gate based multiple threshold voltage devices and circuits | Manoj Joshi, Manfred Eller, Richard J. Carter, Srikanth B. Samavedam, Bongki Lee +1 more | 2016-09-27 |
| 9362180 | Integrated circuit having multiple threshold voltages | Bongki Lee, Jin Ping Liu, Manoj Joshi, Manfred Eller, Richard J. Carter +1 more | 2016-06-07 |
| 9362284 | Threshold voltage control for mixed-type non-planar semiconductor devices | Mitsuhiro Togo, Changyong Xiao, Yiqun Liu, Dina H. Triyoso | 2016-06-07 |
| 9349814 | Gate height uniformity in semiconductor devices | Tsung-Liang Chen, Hung-Wei Liu, Hsin-Neng Tai, Huey-Ming Wang, Tae Hoon Lee +2 more | 2016-05-24 |
| 9209186 | Threshold voltage control for mixed-type non-planar semiconductor devices | Mitsuhiro Togo, Changyong Xiao, Yiqun Liu, Dina H. Triyoso | 2015-12-08 |
| 9157551 | Reconfigurable microactuator and method of configuring same | Zhishan Hua, Erdogan Gulari, Mark A. Burns, Onnop Srivannavit | 2015-10-13 |
| 9159567 | Replacement low-K spacer | Changyong Xiao, Hoong Shing Wong, Deepasree Konduparthi | 2015-10-13 |
| 9093560 | Gate height uniformity in semiconductor devices | Tsung-Liang Chen, Hung-Wei Liu, Hsin-Neng Tai, Huey-Ming Wang, Tae Hoon Lee +2 more | 2015-07-28 |
| 8673710 | Formation of a channel semiconductor alloy by a nitride hard mask layer and an oxide mask | Stephan Kronholz | 2014-03-18 |
| 8674458 | Transistors with embedded strain-inducing material formed in cavities provided by an oxidizing etch process | Stephan Kronholz, Gunda Beernink | 2014-03-18 |
| 8664057 | High-K metal gate electrode structures formed by early cap layer adaptation | Sven Beyer, Andy Wei, Richard J. Carter | 2014-03-04 |
| 8664066 | Formation of a channel semiconductor alloy by forming a nitride based hard mask layer | Stephan Kronholz | 2014-03-04 |
| 8598009 | Self-aligned embedded SiGe structure and method of manufacturing the same | Brian J. Greene, William K. Henson, Judson R. Holt, Michael D. Steigerwalt, Kuldeep Amarnath +1 more | 2013-12-03 |
| 8551599 | Reconfigurable microactuator and method of configuring same | Zhishan Hua, Erdogan Gulari, Mark A. Burns, Onnop Srivannavit | 2013-10-08 |
| 8525289 | Adjusting threshold voltage for sophisticated transistors by diffusing a gate dielectric cap layer material prior to gate dielectric stabilization | Richard J. Carter, Martin Trentzsch, Sven Beyer | 2013-09-03 |
| 8445964 | Fabrication of semiconductors with high-K/metal gate electrodes | Stephan Waidmann | 2013-05-21 |
| 8390042 | Gate etch optimization through silicon dopant profile change | Man Fai Ng | 2013-03-05 |
| 8373228 | Semiconductor transistor device structure with back side source/drain contact plugs, and related manufacturing method | Bin Yang, Michael Hargrove | 2013-02-12 |
| 8294211 | Semiconductor transistor device structure with back side gate contact plugs, and related manufacturing method | Bin Yang, Michael Hargrove | 2012-10-23 |
| 8293609 | Method of manufacturing a transistor device having asymmetric embedded strain elements | Frank Bin Yang, Michael Hargrove | 2012-10-23 |
| 8278165 | Methods for protecting film layers while removing hardmasks during fabrication of semiconductor devices | Janice Monzet | 2012-10-02 |
| 8222673 | Self-aligned embedded SiGe structure and method of manufacturing the same | Brian J. Greene, William K. Henson, Judson R. Holt, Michael D. Steigerwalt, Kuldeep Amarnath +1 more | 2012-07-17 |
| 8217463 | Methods for protecting gate stacks during fabrication of semiconductor devices and semiconductor devices fabricated from such methods | Michael Hargrove, Frank Bin Yang | 2012-07-10 |
| 8198192 | Adjusting threshold voltage for sophisticated transistors by diffusing a gate dielectric cap layer material prior to gate dielectric stabilization | Richard J. Carter, Martin Trentzsch, Sven Beyer | 2012-06-12 |