Issued Patents All Time
Showing 26–50 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10727046 | Surface modified depth controlled deposition for plasma based deposition | Joseph R. Abel, Adrien LaVoie | 2020-07-28 |
| 10727143 | Method for controlling core critical dimension variation using flash trim sequence | Pulkit Agarwal, Adrien LaVoie, Ravi Kumar | 2020-07-28 |
| 10679848 | Selective atomic layer deposition with post-dose treatment | Adrien LaVoie, Ishtak Karim, Jun Qian, Frank L. Pasquale, Bart J. van Schravendijk | 2020-06-09 |
| 10658172 | Dielectric gapfill of high aspect ratio features utilizing a sacrificial etch cap layer | Joseph R. Abel, Pulkit Agarwal, Richard Phillips, Adrien LaVoie | 2020-05-19 |
| 10655224 | Conical wafer centering and holding device for semiconductor processing | Pulkit Agarwal, Ishtak Karim, Adrien LaVoie, Sung Je Kim, Patrick Breiling | 2020-05-19 |
| 10636686 | Method monitoring chamber drift | Joseph R. Abel, Adrien LaVoie | 2020-04-28 |
| 10566187 | Ultrathin atomic layer deposition film accuracy thickness control | Jun Qian, Hu Kang, Adrien LaVoie, Seiji Matsuyama | 2020-02-18 |
| 10526700 | Hardware and process for film uniformity improvement | Hu Kang, Adrien LaVoie, Yi Chung Chiu, Frank L. Pasquale, Jun Qian +5 more | 2020-01-07 |
| 10526701 | Multi-cycle ALD process for film uniformity and thickness profile modulation | Adrien LaVoie, Hu Kang, Jun Qian, Tuan Nguyen, Ye Wang | 2020-01-07 |
| 10494715 | Atomic layer clean for removal of photoresist patterning scum | Pulkit Agarwal, Adrien LaVoie | 2019-12-03 |
| 10431451 | Methods and apparatuses for increasing reactor processing batch size | Pulkit Agarwal, Richard Phillips, Adrien LaVoie | 2019-10-01 |
| 10407773 | Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system | Adrien LaVoie, Hu Kang, Shankar Swaminathan, Jun Qian, Frank L. Pasquale +1 more | 2019-09-10 |
| 10351953 | Systems and methods for flow monitoring in a precursor vapor supply system of a substrate processing system | Jun Qian, Adrien LaVoie, You Zhai, Jeremiah Baldwin, Sung Je Kim | 2019-07-16 |
| 10311723 | Parking management system and method | Suman A. Sehra, Sameer Sharma, Karthik Vasan, Sergio Piedrahita, Robin Mcgechie | 2019-06-04 |
| 10269559 | Dielectric gapfill of high aspect ratio features utilizing a sacrificial etch cap layer | Joseph R. Abel, Pulkit Agarwal, Richard Phillips, Adrien LaVoie | 2019-04-23 |
| 10224235 | Systems and methods for creating airgap seals using atomic layer deposition and high density plasma chemical vapor deposition | Jason D. Park, Bart J. van Schravendijk, Hsiang-Yun Lee | 2019-03-05 |
| 10100407 | Hardware and process for film uniformity improvement | Hu Kang, Adrien LaVoie, Yi Chung Chiu, Frank L. Pasquale, Jun Qian +5 more | 2018-10-16 |
| 10094018 | Dynamic precursor dosing for atomic layer deposition | Adrien LaVoie, Jun Qian, Hu Kang, Ishtak Karim, Fung Suong Ou | 2018-10-09 |
| 10074543 | High dry etch rate materials for semiconductor patterning applications | Arpan Mahorowala, Ishtak Karim, Shankar Swaminathan, Adrien LaVoie | 2018-09-11 |
| 10062563 | Selective atomic layer deposition with post-dose treatment | Adrien LaVoie, Ishtak Karim, Jun Qian, Frank L. Pasquale, Bart J. van Schravendijk | 2018-08-28 |
| 10037884 | Selective atomic layer deposition for gapfill using sacrificial underlayer | Fung Suong Ou, Adrien LaVoie, Ishtak Karim, Jun Qian | 2018-07-31 |
| 9997371 | Atomic layer etch methods and hardware for patterning applications | Pulkit Agarwal, Adrien LaVoie | 2018-06-12 |
| 9970108 | Systems and methods for vapor delivery in a substrate processing system | Jun Qian, Hu Kang, Chloe Baldasseroni, Heather Landis, Andrew Duvall +11 more | 2018-05-15 |
| 9870917 | Variable temperature hardware and methods for reduction of wafer backside deposition | Hu Kang, Ishtak Karim, Jun Qian, Ramesh Chandrasekharan, Adrien LaVoie | 2018-01-16 |
| 9624578 | Method for RF compensation in plasma assisted atomic layer deposition | Jun Qian, Frank L. Pasquale, Adrien LaVoie, Chloe Baldasseroni, Hu Kang +7 more | 2017-04-18 |