Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7838434 | Method of plasma etching of high-K dielectric materials | Guangxiang Jin, Ajay Kumar | 2010-11-23 |
| 7320942 | Method for removal of metallic residue after plasma etching of a metal layer | Xiaoyi Chen, Chentsau Ying, Ajay Kumar, Ralph Kerns, Ying Rui +3 more | 2008-01-22 |
| 7217665 | Method of plasma etching high-K dielectric materials with high selectivity to underlying layers | Guangxiang Jin, Ajay Kumar | 2007-05-15 |
| 7105361 | Method of etching a magnetic material | Xiaoyi Chen, Chentsau Ying, Ajay Kumar | 2006-09-12 |
| 7094704 | Method of plasma etching of high-K dielectric materials | Guangxiang Jin, Ajay Kumar | 2006-08-22 |
| 6984585 | Method for removal of residue from a magneto-resistive random access memory (MRAM) film stack using a sacrificial mask layer | Chentsau Ying, Xiaoyi Chen, Ajay Kumar | 2006-01-10 |
| 6964928 | Method for removing residue from a magneto-resistive random access memory (MRAM) film stack using a dual mask | Chentsau Ying, Xiaoyi Chen, Ajay Kumar | 2005-11-15 |
| 6942813 | Method of etching magnetic and ferroelectric materials using a pulsed bias source | Chentsau Ying, Ajay Kumar, Xiaoyi Chen | 2005-09-13 |
| 6943039 | Method of etching ferroelectric layers | Chentsau Ying, Ajay Kumar | 2005-09-13 |
| 6902681 | Method for plasma etching of high-K dielectric materials | Ajay Kumar | 2005-06-07 |
| 6893893 | Method of preventing short circuits in magnetic film stacks | Ajay Kumar, Jeng H. Hwang, Guangxiang Jin, Ralph Kerns | 2005-05-17 |
| 6855643 | Method for fabricating a gate structure | Ajay Kumar | 2005-02-15 |
| 6806095 | Method of plasma etching of high-K dielectric materials with high selectivity to underlying layers | Guangxiang Jin, Ajay Kumar | 2004-10-19 |
| 6767824 | Method of fabricating a gate structure of a field effect transistor using an alpha-carbon mask | Ajay Kumar, Guangxiang Jin, Wei Liu | 2004-07-27 |
| 6759286 | Method of fabricating a gate structure of a field effect transistor using a hard mask | Ajay Kumar | 2004-07-06 |
| 6759340 | Method of etching a trench in a silicon-on-insulator (SOI) structure | Ajay Kumar, Anisul Khan, Chan Syun David Yang | 2004-07-06 |
| 6759263 | Method of patterning a layer of magnetic material | Chentsau Ying, Xiaoyi Chen, Ajay Kumar | 2004-07-06 |
| 6660127 | Apparatus for plasma etching at a constant etch rate | John Holland, Valentin Todorov, Thorsten Lill | 2003-12-09 |
| 6642151 | Techniques for plasma etching silicon-germanium | Anisul Khan, Ajay Kumar | 2003-11-04 |
| 6642127 | Method for dicing a semiconductor wafer | Ajay Kumar, Anisul Khan, Dragan Podlesnik | 2003-11-04 |
| 6638874 | Methods used in fabricating gates in integrated circuit device structures | Sang In Yi, Seowoo Nam, Kenlin Huang | 2003-10-28 |
| 6583065 | Sidewall polymer forming gas additives for etching processes | Raney Williams, Jeffrey D. Chinn, Jitske Trevor, Thorsten Lill, Tamas Varga +1 more | 2003-06-24 |
| 6579806 | Method of etching tungsten or tungsten nitride in semiconductor structures | Hakeem Oluseyi | 2003-06-17 |
| 6531404 | Method of etching titanium nitride | Tong Zhang | 2003-03-11 |
| 6503845 | Method of etching a tantalum nitride layer in a high density plasma | — | 2003-01-07 |