Issued Patents All Time
Showing 25 most recent of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11222961 | Lateral semiconductor device having raised source and drain, and method of manufacture thererof | Viet Thanh Dinh, Guido Sasse | 2022-01-11 |
| 10580906 | Semiconductor device comprising a PN junction diode | Viet Thanh Dinh, Marina Vroubel | 2020-03-03 |
| 9847389 | Semiconductor device including an active region and two layers having different stress characteristics | Brian A. Winstead, Vance H. Adams | 2017-12-19 |
| 8980734 | Gate security feature | Tab A. Stephens, Perry H. Pelley, Michael B. McShane | 2015-03-17 |
| 8569858 | Semiconductor device including an active region and two layers having different stress characteristics | Brian A. Winstead, Vance H. Adams | 2013-10-29 |
| 8021957 | Process of forming an electronic device including insulating layers having different strains | Venkat R. Kolagunta, Mehul D. Shroff | 2011-09-20 |
| 7843011 | Electronic device including insulating layers having different strains | Venkat R. Kolagunta, Mehul D. Shroff | 2010-11-30 |
| 7745298 | Method of forming a via | Tab A. Stephens, Olubunmi O. Adetutu, Matthew T. Herrick | 2010-06-29 |
| 7736957 | Method of making a semiconductor device with embedded stressor | Veeraraghavan Dhandapani, Darren V. Goedeke, Voon-Yew Thean, Stefan Zollner | 2010-06-15 |
| 7714318 | Electronic device including a transistor structure having an active region adjacent to a stressor layer | Vance H. Adams, Venkat R. Kolagunta, Brian A. Winstead | 2010-05-11 |
| 7700499 | Multilayer silicon nitride deposition for a semiconductor device | Kurt H. Junker, Xiang-Zheng Bo, Tien Ying Luo | 2010-04-20 |
| 7687354 | Fabrication of a semiconductor device with stressor | Veeraraghavan Dhandapani, Stefan Zollner | 2010-03-30 |
| 7678698 | Method of forming a semiconductor device with multiple tensile stressor layers | Xiangzheng Bo, Tien Ying Luo, Kurt H. Junker, Venkat R. Kolagunta | 2010-03-16 |
| 7579228 | Disposable organic spacers | Kurt H. Junker, Thomas J. Kropewnicki, Andrew G. Nagy | 2009-08-25 |
| 7538002 | Semiconductor process integrating source/drain stressors and interlevel dielectric layer stressors | Da Zhang, Vance H. Adams, Bich-Yen Nguyen | 2009-05-26 |
| 7528029 | Stressor integration and method thereof | Darren V. Goedekc, John J. Hackenberg | 2009-05-05 |
| 7511360 | Semiconductor device having stressors and method for forming | Mehul D. Shroff | 2009-03-31 |
| 7504289 | Process for forming an electronic device including transistor structures with sidewall spacers | Sangwoo Lim, Stanley L. Filipiak, Venkat R. Kolagunta | 2009-03-17 |
| 7491630 | Undoped gate poly integration for improved gate patterning and cobalt silicide extendibility | Mehul D. Shroff, Mark D. Hall, Tab A. Stephens | 2009-02-17 |
| 7442598 | Method of forming an interlayer dielectric | Stanley M. Filipiak, Yongloo Jeon, Chad Weintraub | 2008-10-28 |
| 7420202 | Electronic device including a transistor structure having an active region adjacent to a stressor layer and a process for forming the electronic device | Vance H. Adams, Venkat R. Kolagunta, Brian A. Winstead | 2008-09-02 |
| 7416605 | Anneal of epitaxial layer in a semiconductor device | Stefan Zollner, Veeraraghavan Dhandapani, Gregory S. Spencer | 2008-08-26 |
| 7402472 | Method of making a nitrided gate dielectric | Sangwoo Lim, Tien Ying Luo, Olubunmi O. Adetutu, Hsing-Huang Tseng | 2008-07-22 |
| 7214590 | Method of forming an electronic device | Sangwoo Lim, Mohamad Jahanbani, Hsing-Huang Tseng, Choh Fei Yeap | 2007-05-08 |
| 7132704 | Transistor sidewall spacer stress modulation | — | 2006-11-07 |