Issued Patents All Time
Showing 25 most recent of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9812558 | Three-dimensional transistor and methods of manufacturing thereof | Jhih-Yang Yan, Samuel C. Pan, Chee-Wee Liu, Hung-Yu Yeh | 2017-11-07 |
| 9627411 | Three-dimensional transistor and methods of manufacturing thereof | Jhih-Yang Yan, Samuel C. Pan, Chee-Wee Liu, Hung-Yu Yeh | 2017-04-18 |
| 8962410 | Transistors with different threshold voltages | Konstantin V. Loiko, Spencer E. Williams, Brian A. Winstead | 2015-02-24 |
| 8330231 | Transistor having gate dielectric protection and structure | Ning Liu, Mohamed S. Moosa | 2012-12-11 |
| 8039341 | Selective uniaxial stress modification for use with strained silicon on insulator integrated circuit | Voon-Yew Thean, Bich-Yen Nguyen | 2011-10-18 |
| 8003454 | CMOS process with optimized PMOS and NMOS transistor devices | Srikanth B. Samavedam, Voon-Yew Thean, Xiangdong Chen | 2011-08-23 |
| 7927989 | Method for forming a transistor having gate dielectric protection and structure | Ning Liu, Mohamed S. Moosa | 2011-04-19 |
| 7883953 | Method for transistor fabrication with optimized performance | Voon-Yew Thean, Christopher V. Baiocco, Jie Chen, Weipeng Li, Young Way Teh +1 more | 2011-02-08 |
| 7879666 | Semiconductor resistor formed in metal gate stack | Chendong Zhu, Xiangdong Chen, Melanie J. Sherony | 2011-02-01 |
| 7858482 | Method of forming a semiconductor device using stress memorization | Christopher C. Hobbs, Srikanth B. Samavedam | 2010-12-28 |
| 7833852 | Source/drain stressors formed using in-situ epitaxial growth | Brian A. Winstead, Vishal P. Trivedi | 2010-11-16 |
| 7800141 | Electronic device including a semiconductor fin | Bich-Yen Nguyen | 2010-09-21 |
| 7795089 | Forming a semiconductor device having epitaxially grown source and drain regions | Laegu Kang, Vishal P. Trivedi | 2010-09-14 |
| 7763510 | Method for PFET enhancement | Voon-Yew Thean | 2010-07-27 |
| 7727870 | Method of making a semiconductor device using a stressor | Xiangzheng Bo, Venkat R. Kolagunta | 2010-06-01 |
| 7687337 | Transistor with differently doped strained current electrode region | Mark C. Foisy | 2010-03-30 |
| 7615806 | Method for forming a semiconductor structure and structure thereof | Voon-Yew Thean, Jian Chen, Bich-Yen Nguyen, Mariam Sadaka | 2009-11-10 |
| 7575975 | Method for forming a planar and vertical semiconductor structure having a strained semiconductor layer | Voon-Yew Thean, Jian Chen, Bich-Yen Nguyen, Mariam Sadaka | 2009-08-18 |
| 7572706 | Source/drain stressor and method therefor | Brian A. Winstead | 2009-08-11 |
| 7544997 | Multi-layer source/drain stressor | Veeraraghavan Dhandapani, Darren V. Goedeke, Jill C. Hildreth | 2009-06-09 |
| 7538002 | Semiconductor process integrating source/drain stressors and interlevel dielectric layer stressors | Vance H. Adams, Bich-Yen Nguyen, Paul A. Grudowski | 2009-05-26 |
| 7514313 | Process of forming an electronic device including a seed layer and a semiconductor layer selectively formed over the seed layer | Omar Zia, Venkat R. Kolagunta, Narayanan C. Ramani, Bich-Yen Nguyen | 2009-04-07 |
| 7494856 | Semiconductor fabrication process using etch stop layer to optimize formation of source/drain stressor | Ted R. White, Bich-Yen Nguyen | 2009-02-24 |
| 7479422 | Semiconductor device with stressors and method therefor | Brian A. Winstead, Ted R. White | 2009-01-20 |
| 7446026 | Method of forming a CMOS device with stressor source/drain regions | Bich-Yen Nguyen | 2008-11-04 |