Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12080592 | Film stack simplification for high aspect ratio patterning and vertical scaling | Hui-Jung Wu, Bart J. van Schravendijk, Mark Kawaguchi, Gereng Gunawan, Jay E. Uglow +11 more | 2024-09-03 |
| 12040180 | Nitride films with improved etch selectivity for 3D NAND integration | Pramod Subramonium, Malay Milan Samantaray, Katsunori Yoshizawa, Bart J. VanSchravendijk | 2024-07-16 |
| 11869770 | Selective deposition of etch-stop layer for enhanced patterning | Kapu Sirish Reddy, Jon Henri, Pengyi Zhang, Elham Mohimi, Bhavin Jariwala +1 more | 2024-01-09 |
| 11859282 | Manifold valve for controlling multiple gases | Damodar Rajaram Shanbhag | 2024-01-02 |
| 11427908 | Manifold valve for multiple precursors | Damodar Rajaram Shanbhag | 2022-08-30 |
| 11094542 | Selective deposition of etch-stop layer for enhanced patterning | Kapu Sirish Reddy, Jon Henri, Pengyi Zhang, Elham Mohimi, Bhavin Jariwala +1 more | 2021-08-17 |
| 10998187 | Selective deposition with atomic layer etch reset | Kapu Sirish Reddy, Meliha Gozde Rainville, Dennis M. Hausmann, David Charles Smith, Karthik Sivaramakrishnan +1 more | 2021-05-04 |
| 10900124 | Substrate processing chamber with showerhead having cooled faceplate | Damodar Rajaram Shanbhag | 2021-01-26 |
| 10804144 | Deposition of aluminum oxide etch stop layers | Meliha Gozde Rainville, Kapu Sirish Reddy, Dennis M. Hausmann | 2020-10-13 |
| 10745806 | Showerhead with air-gapped plenums and overhead isolation gas distributor | Jeffrey Womack, Meliha Gozde Rainville, Emile C. Draper, Pankaj G. Ramnani, Feng Bi +3 more | 2020-08-18 |
| 10665501 | Deposition of Aluminum oxide etch stop layers | Meliha Gozde Rainville, Kapu Sirish Reddy, Dennis M. Hausmann | 2020-05-26 |
| 10651080 | Oxidizing treatment of aluminum nitride films in semiconductor device manufacturing | Meliha Gozde Rainville, Daniel Damjanovic, Kapu Sirish Reddy | 2020-05-12 |
| 10643889 | Pre-treatment method to improve selectivity in a selective deposition process | Dennis M. Hausmann, Elham Mohimi, Pengyi Zhang, Paul C. Lemaire, Kashish Sharma +3 more | 2020-05-05 |
| 10580690 | Staircase encapsulation in 3D NAND fabrication | Yongsik Yu, Bart J. van Schravendijk, Bhadri N. Varadarajan | 2020-03-03 |
| 10566194 | Selective deposition of etch-stop layer for enhanced patterning | Kapu Sirish Reddy, Jon Henri, Pengyi Zhang, Elham Mohimi, Bhavin Jariwala +1 more | 2020-02-18 |
| 10559461 | Selective deposition with atomic layer etch reset | Kapu Sirish Reddy, Meliha Gozde Rainville, Dennis M. Hausmann, David Charles Smith, Karthik Sivaramakrishnan +1 more | 2020-02-11 |
| 10472716 | Showerhead with air-gapped plenums and overhead isolation gas distributor | Jeffrey Womack, Meliha Gozde Rainville, Emile C. Draper, Pankaj G. Ramnani, Feng Bi +3 more | 2019-11-12 |
| 10418236 | Composite dielectric interface layers for interconnect structures | Kapu Sirish Reddy, Shankar Swaminathan, Meliha Gozde Rainville, Frank L. Pasquale | 2019-09-17 |
| 10199235 | Liner and barrier applications for subtractive metal integration | Hui-Jung Wu, Thomas Knisley, Meihua Shen, John Hoang, Prithu Sharma | 2019-02-05 |
| 10049869 | Composite dielectric interface layers for interconnect structures | Kapu Sirish Reddy, Shankar Swaminathan, Meliha Gozde Rainville, Frank L. Pasquale | 2018-08-14 |
| 10002787 | Staircase encapsulation in 3D NAND fabrication | Yongsik Yu, Bart J. van Schravendijk, Bhadri N. Varadarajan | 2018-06-19 |
| 9899234 | Liner and barrier applications for subtractive metal integration | Hui-Jung Wu, Thomas Knisley, Meihua Shen, John Hoang, Prithu Sharma | 2018-02-20 |
| 9859153 | Deposition of aluminum oxide etch stop layers | Meliha Gozde Rainville, Kapu Sirish Reddy, Dennis M. Hausmann | 2018-01-02 |
| 9633896 | Methods for formation of low-k aluminum-containing etch stop films | Daniel Damjanovic, Pramod Subramonium | 2017-04-25 |
| 9418889 | Selective formation of dielectric barriers for metal interconnects in semiconductor devices | Thomas W. Mountsier, Hui-Jung Wu, Bhadri N. Varadarajan, William T. Lee | 2016-08-16 |