Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11776806 | Multi-step pre-clean for selective metal gap fill | Xi Cen, Yakuan Yao, Yiming Lai, Kai Wu, Avgerinos V. Gelatos +8 more | 2023-10-03 |
| 11384428 | Carbon layer covered mask in 3D applications | Thomas Jongwan Kwon, Jong Mun Kim, Chentsau Chris Ying | 2022-07-12 |
| 11380536 | Multi-step pre-clean for selective metal gap fill | Xi Cen, Yakuan Yao, Yiming Lai, Kai Wu, Avgerinos V. Gelatos +8 more | 2022-07-05 |
| 11145808 | Methods for etching a structure for MRAM applications | Jong Mun Kim, Minrui Yu, Chando Park, Jaesoo Ahn, Chentsau Chris Ying +3 more | 2021-10-12 |
| 10957548 | Method of etching copper indium gallium selenide (CIGS) material | Jong Mun Kim, Chentsau Chris Ying | 2021-03-23 |
| 10490406 | Systems and methods for material breakthrough | Mandar B. Pandit, Tom Choi, Nitin K. Ingle | 2019-11-26 |
| 10424487 | Atomic layer etching processes | Jungmin Ko, Tom Choi, Junghoon Kim, Sean S. Kang | 2019-09-24 |
| 10354889 | Non-halogen etching of silicon-containing materials | Tom Choi, Mandar B. Pandit, Nitin K. Ingle | 2019-07-16 |
| 9543163 | Methods for forming features in a material layer utilizing a combination of a main etching and a cyclical etching process | Jungmin Ko, Sean S. Kang, Jeremiah T. Pender, Srinivas D. Nemani, Bradley J. Howard | 2017-01-10 |
| 9059398 | Methods for etching materials used in MRAM applications | Jisoo Kim, Khoi Doan, Chi Hong Ching, Srinivas D. Nemani | 2015-06-16 |
| 8980758 | Methods for etching an etching stop layer utilizing a cyclical etching process | Sean S. Kang, Jeremiah T. Pender, Srinivas D. Nemani, Bradley J. Howard | 2015-03-17 |
| 8932959 | Method and system for etching plural layers on a workpiece including a lower layer containing an advanced memory material | Srinivas D. Nemani, Jeremiah T. Pender, Kartik Ramaswamy, Andrew Nguyen, Sergey G. Belostotskiy +1 more | 2015-01-13 |
| 7910736 | Method for producing organic field-effect transistors | Martin Koenemann, Peter Erk, Zhenan Bao | 2011-03-22 |