| 9219232 |
Antimony and germanium complexes useful for CVD/ALD of metal thin films |
William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum +3 more |
2015-12-22 |
| 8877549 |
Low temperature deposition of phase change memory materials |
Jeffrey F. Roeder, Thomas H. Baum, Bryan C. Hendrix, Chongying Xu, William Hunks +2 more |
2014-11-04 |
| 8709863 |
Antimony and germanium complexes useful for CVD/ALD of metal thin films |
William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum +3 more |
2014-04-29 |
| 8679894 |
Low temperature deposition of phase change memory materials |
Jeffrey F. Roeder, Thomas H. Baum, Bryan C. Hendrix, Chongying Xu, William Hunks +2 more |
2014-03-25 |
| 8603252 |
Cleaning of semiconductor processing systems |
Frank Dimeo, Jr., James Dietz, W. Karl Olander, Robert Kaim, Steven E. Bishop +7 more |
2013-12-10 |
| 8288198 |
Low temperature deposition of phase change memory materials |
Jeffrey F. Roeder, Thomas H. Baum, Bryan C. Hendrix, Chongying Xu, William Hunks +2 more |
2012-10-16 |
| 8268665 |
Antimony and germanium complexes useful for CVD/ALD of metal thin films |
William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum +3 more |
2012-09-18 |
| 8008117 |
Antimony and germanium complexes useful for CVD/ALD of metal thin films |
William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum +4 more |
2011-08-30 |
| 7858525 |
Fluorine-free precursors and methods for the deposition of conformal conductive films for nanointerconnect seed and fill |
Juan E. Dominguez, Adrien LaVoie, John J. Plombon, Joseph H. Han, Harsono S. Simka +1 more |
2010-12-28 |
| 7838329 |
Antimony and germanium complexes useful for CVD/ALD of metal thin films |
William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum +4 more |
2010-11-23 |
| 6900498 |
Barrier structures for integration of high K oxides with Cu and Al electrodes |
Bryan C. Hendrix, Jeffrey F. Roeder, Ing-Shin Chen |
2005-05-31 |
| 6599447 |
Zirconium-doped BST materials and MOCVD process forming same |
Philip S. H. Chen, Jeffrey F. Roeder |
2003-07-29 |
| 6277436 |
Liquid delivery MOCVD process for deposition of high frequency dielectric materials |
Jeffrey F. Roeder, Thomas H. Baum |
2001-08-21 |
| 5948322 |
Source reagents for MOCVD formation of non-linear optically active metal borate films and optically active metal borate films formed therefrom |
Thomas H. Baum, Daniel Studebaker, Brian A. Vaartstra |
1999-09-07 |
| 5932905 |
Article comprising a capacitor with non-perovskite Sr-Ba-Ti oxide dielectric thin film |
Henry M. O'Bryan, Jr., Jeffrey F. Roeder, Roderick K. Watts |
1999-08-03 |
| 5919522 |
Growth of BaSrTiO.sub.3 using polyamine-based precursors |
Thomas H. Baum, Peter S. Kirlin, Duncan W. Brown, Robin A. Gardiner, Gautam Bhandari +1 more |
1999-07-06 |
| 5711816 |
Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same |
Peter S. Kirlin, Robin L. Binder, Robin A. Gardiner, Peter C. Van Buskirk, Jiming Zhang |
1998-01-27 |
| 5705443 |
Etching method for refractory materials |
Robin A. Gardiner, Peter S. Kirlin, Peter C. Van Buskirk |
1998-01-06 |
| 5536323 |
Apparatus for flash vaporization delivery of reagents |
Peter S. Kirlin, Robin L. Binder, Robin A. Gardiner, Peter Buskirk, Jiming Zhang |
1996-07-16 |