Issued Patents All Time
Showing 1–25 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10229840 | Ion implanter comprising integrated ventilation system | Ying Tang, Barry Lewis Chambers, Steven E. Bishop | 2019-03-12 |
| 9991095 | Ion source cleaning in semiconductor processing systems | Joseph D. Sweeney, Sharad N. Yedave, Oleg Byl, Robert Kaim, David Eldridge +3 more | 2018-06-05 |
| 9455147 | Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation | Jose I. Arno, Robert Kaim | 2016-09-27 |
| 9383064 | Ventilation gas management systems and processes | Paul J. Marganski | 2016-07-05 |
| 8603252 | Cleaning of semiconductor processing systems | Frank Dimeo, Jr., James Dietz, Robert Kaim, Steven E. Bishop, Jeffrey W. Neuner +7 more | 2013-12-10 |
| 8389068 | Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation | Jose I. Arno, Robert Kaim | 2013-03-05 |
| 8282023 | Fluid storage and dispensing systems, and fluid supply processes comprising same | James V. McManus, Steven J. Hultquist, Jose I. Arno, Peter C. Van Buskirk | 2012-10-09 |
| 7951225 | Fluid storage and dispensing systems, and fluid supply processes comprising same | James V. McManus, Steven J. Hultquist, Jose I. Arno, Peter C. Van Buskirk | 2011-05-31 |
| 7943204 | Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation | Jose I. Arno, Robert Kaim | 2011-05-17 |
| 7857880 | Semiconductor manufacturing facility utilizing exhaust recirculation | Joseph D. Sweeney, Luping Wang | 2010-12-28 |
| 7819981 | Methods for cleaning ion implanter components | Frank Dimeo, Jr., James Dietz, Robert Kaim, Steven E. Bishop, Jeffrey W. Neuner +1 more | 2010-10-26 |
| 7798168 | Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases | Matthew B. Donatucci, Luping Wang, Michael J. Wodjenski | 2010-09-21 |
| 7614421 | Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases | Matthew B. Donatucci, Luping Wang, Michael J. Wodjenski | 2009-11-10 |
| 7485169 | Semiconductor manufacturing facility utilizing exhaust recirculation | Joseph D. Sweeney, Luping Wang | 2009-02-03 |
| 7364603 | Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream | Joseph D. Sweeney, Paul J. Marganski | 2008-04-29 |
| 7328716 | Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases | Matthew B. Donatucci, Luping Wang, Michael J. Wodjenski | 2008-02-12 |
| 7284564 | Gas storage and dispensing system for variable conductance dispensing of gas at constant flow rate | — | 2007-10-23 |
| 7105037 | Semiconductor manufacturing facility utilizing exhaust recirculation | Joseph D. Sweeney, Luping Wang | 2006-09-12 |
| 6997202 | Gas storage and dispensing system for variable conductance dispensing of gas at constant flow rate | — | 2006-02-14 |
| 6868869 | Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gases | — | 2005-03-22 |
| 6857447 | Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gases | Matthew B. Donatucci, Luping Wang, Michael J. Wodjenski | 2005-02-22 |
| 6845619 | Integrated system and process for effluent abatement and energy generation | — | 2005-01-25 |
| 6841141 | System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (XFn) compounds for use in cleaning semiconductor processing chambers | Jose I. Arno | 2005-01-11 |
| 6805728 | Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream | Joseph D. Sweeney, Paul J. Marganski, Luping Wang | 2004-10-19 |
| 6770117 | Ion implantation and wet bench systems utilizing exhaust gas recirculation | — | 2004-08-03 |