Issued Patents All Time
Showing 25 most recent of 54 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12308216 | Mechanical suppression of parasitic plasma in substrate processing chamber | Edward Augustyniak, Karl Leeser, Mohamed Sabri | 2025-05-20 |
| 11862435 | Mechanical suppression of parasitic plasma in substrate processing chamber | Edward Augustyniak, Karl Leeser, Mohamed Sabri | 2024-01-02 |
| 11725282 | Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region | Chunguang Xia, Ramesh Chandrasekharan, Edward Augustyniak, Karl Leeser | 2023-08-15 |
| 11621150 | Mechanical suppression of parasitic plasma in substrate processing chamber | Edward Augustyniak, Karl Leeser, Mohamed Sabri | 2023-04-04 |
| 11393729 | Systems and methods for controlling plasma instability in semiconductor fabrication | Yukinori Sakiyama, Edward Augustyniak | 2022-07-19 |
| 11127567 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Hu Kang, Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni +8 more | 2021-09-21 |
| 11111581 | Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region | Chunguang Xia, Ramesh Chandrasekharan, Edward Augustyniak, Karl Leeser | 2021-09-07 |
| 10876209 | Systems and methods for determining film thickness using DC self-bias voltage | Edward Augustyniak | 2020-12-29 |
| 10665429 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Hu Kang, Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni +8 more | 2020-05-26 |
| 10510625 | Systems and methods for controlling plasma instability in semiconductor fabrication | Yukinori Sakiyama, Edward Augustyniak | 2019-12-17 |
| 10475627 | Carrier ring wall for reduction of back-diffusion of reactive species and suppression of local parasitic plasma ignition | Chengzhu Qi, Yukinori Sakiyama, Bin Luo, Pramod Subramonium, Chunhai Ji +1 more | 2019-11-12 |
| 10378109 | Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltage | Edward Augustyniak | 2019-08-13 |
| 10287683 | Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region | Chunguang Xia, Ramesh Chandrasekharan, Edward Augustyniak, Karl Leeser | 2019-05-14 |
| 10224182 | Mechanical suppression of parasitic plasma in substrate processing chamber | Edward Augustyniak, Karl Leeser, Mohamed Sabri | 2019-03-05 |
| 10128160 | Systems and methods for detection of plasma instability by electrical measurement | Yukinori Sakiyama, Ishtak Karim, Yaswanth Rangineni, Adrien LaVoie, Ramesh Chandrasekharan +1 more | 2018-11-13 |
| 10121708 | Systems and methods for detection of plasma instability by optical diagnosis | Yukinori Sakiyama, Edward Augustyniak | 2018-11-06 |
| 9997422 | Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability | Ishtak Karim, Yukinori Sakiyama, Yaswanth Rangineni, Edward Augustyniak, Ramesh Chandrasekharan +2 more | 2018-06-12 |
| 9941113 | Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication | Ishtak Karim, Yaswanth Rangineni, Adrien LaVoie, Yukinori Sakiyama, Edward Augustyniak +2 more | 2018-04-10 |
| 9875883 | Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching | Yukinori Sakiyama, Yaswanth Rangineni, Jeremy Tucker, Edward Augustyniak, Sunil Kapoor | 2018-01-23 |
| 9824941 | Systems and methods for detection of plasma instability by electrical measurement | Yukinori Sakiyama, Ishtak Karim, Yaswanth Rangineni, Adrien LaVoie, Ramesh Chandrasekharan +1 more | 2017-11-21 |
| 9793096 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Hu Kang, Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni +8 more | 2017-10-17 |
| 9754769 | Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching | Yukinori Sakiyama, Yaswanth Rangineni, Jeremy Tucker, Edward Augustyniak, Sunil Kapoor | 2017-09-05 |
| 9644271 | Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication | Ishtak Karim, Yaswanth Rangineni, Adrien LaVoie, Yukinori Sakiyama, Edward Augustyniak +2 more | 2017-05-09 |
| 9449795 | Ceramic showerhead with embedded RF electrode for capacitively coupled plasma reactor | Mohamed Sabri, Edward Augustyniak, Ramkishan Rao Lingampalli, Karl Leeser, Cody Barnett | 2016-09-20 |
| 9404183 | Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltage | Edward Augustyniak | 2016-08-02 |