Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8301288 | Optimized scheduling based on sensitivity data | Brian T. Denton, Shreesh S. Tandel, Steven H. Voldman | 2012-10-30 |
| 7960288 | Photoresist trimming process | Shaun Crawford, A. Gary Reid, Adam C. Smith, Thomas M. Wagner | 2011-06-14 |
| 7955988 | Photoresist trimming process | Shaun Crawford, A. Gary Reid, Adam C. Smith, Thomas M. Wagner | 2011-06-07 |
| 7754394 | Method to etch chrome for photomask fabrication | Shaun Crawford, Thomas B. Faure, James P. Levin | 2010-07-13 |
| 7304000 | Photoresist trimming process | Shaun Crawford, A. Gary Reid, Adam C. Smith, Thomas M. Wagner | 2007-12-04 |
| 7014959 | CD uniformity of chrome etch to photomask process | Shaun Crawford, Timothy J. Dalton, Thomas B. Faure, Michelle L. Steen, Thomas M. Wagner | 2006-03-21 |
| 6599173 | Method to prevent leaving residual metal in CMP process of metal interconnect | Jose Luis Cruz, Timothy C. Krywanczyk, Douglas K. Sturtevant | 2003-07-29 |
| 6468135 | Method and apparatus for multiphase chemical mechanical polishing | Jose Luis Cruz, David Walker | 2002-10-22 |
| 6432823 | Off-concentric polishing system design | Paul A. Manfredi, Thomas J. Martin, Douglas P. Nadeau, Yutong Wu | 2002-08-13 |
| 6387810 | Method for homogenizing device parameters through photoresist planarization | Gary J. Beardsley, Zhong-Xiang He, Michael P. McMahon | 2002-05-14 |
| 6352596 | Post CMP cleaning method using a brush cleaner with torque monitor | Gary J. Beardsley, Timothy Scott Bullard, Theodore G. van Kessel, David Walker | 2002-03-05 |
| 6299515 | CMP apparatus with built-in slurry distribution and removal | Gary J. Beardsley, Steven J. Messier, David Walker | 2001-10-09 |
| 6300246 | Method for chemical mechanical polishing of semiconductor wafer | Paul A. Manfredi, Thomas J. Martin, Douglas P. Nadeau | 2001-10-09 |
| 6287178 | Wafer carrier rinsing mechanism | Paul A. Manfredi, Thomas J. Martin, Douglas P. Nadeau, Joseph M. Weatherwax, Jr. | 2001-09-11 |
| 6269510 | Post CMP clean brush with torque monitor | Gary J. Beardsley, Timothy Scott Bullard, Theodore G. van Kessel, David Walker | 2001-08-07 |
| 6190237 | pH-buffered slurry and use thereof for polishing | Mahadevaiyer Krishnan, Michael MacDonald, Mark P. Murray | 2001-02-20 |
| 6179693 | In-situ/self-propelled polishing pad conditioner and cleaner | Gary J. Beardsley, David Walker | 2001-01-30 |
| 6171436 | Apparatus for removing slurry particles | Harold G. Linde, Patricia E. Marmillion, Anthony M. Palagonia, Bernadette Ann Pierson, Matthew J. Rutten | 2001-01-09 |
| 6135865 | CMP apparatus with built-in slurry distribution and removal | Gary J. Beardsley, Steven J. Messier, David Walker | 2000-10-24 |
| 5981148 | Method for forming sidewall spacers using frequency doubling hybrid resist and device formed thereby | Jeffrey S. Brown, James S. Dunn, Steven J. Holmes, Robert K. Leidy, Paul W. Pastel | 1999-11-09 |
| 5976768 | Method for forming sidewall spacers using frequency doubling hybrid resist and device formed thereby | Jeffrey S. Brown, James S. Dunn, Steven J. Holmes, Robert K. Leidy, Paul W. Pastel | 1999-11-02 |
| 5974868 | Downstream monitor for CMP brush cleaners | Donald M. DeCain, Robert A. Jurjevic, Douglas P. Nadeau, Marc A. Taubenblatt | 1999-11-02 |
| 5935869 | Method of planarizing semiconductor wafers | Rangarajan Jagannathan, Amarnath Jha, Thomas J. Martin, Keith R. Pope, Thomas E. Sandwick | 1999-08-10 |
| 5896870 | Method of removing slurry particles | Harold G. Linde, Patricia E. Marmillion, Anthony M. Palagonia, Bernadette Ann Pierson, Matthew J. Rutten | 1999-04-27 |
| 5834642 | Downstream monitor for CMP brush cleaners | Donald M. DeCain, Robert A. Jurjevic, Douglas P. Nadeau, Marc A. Taubenblatt | 1998-11-10 |