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Pattern compensation techniques for charged particle lithographic masks |
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2006-06-27 |
| 6468135 |
Method and apparatus for multiphase chemical mechanical polishing |
Jose Luis Cruz, Cuc K. Huynh |
2002-10-22 |
| 6352596 |
Post CMP cleaning method using a brush cleaner with torque monitor |
Gary J. Beardsley, Timothy Scott Bullard, Cuc K. Huynh, Theodore G. van Kessel |
2002-03-05 |
| 6299515 |
CMP apparatus with built-in slurry distribution and removal |
Gary J. Beardsley, Cuc K. Huynh, Steven J. Messier |
2001-10-09 |
| 6269510 |
Post CMP clean brush with torque monitor |
Gary J. Beardsley, Timothy Scott Bullard, Cuc K. Huynh, Theodore G. van Kessel |
2001-08-07 |
| 6179693 |
In-situ/self-propelled polishing pad conditioner and cleaner |
Gary J. Beardsley, Cuc K. Huynh |
2001-01-30 |
| 6135865 |
CMP apparatus with built-in slurry distribution and removal |
Gary J. Beardsley, Cuc K. Huynh, Steven J. Messier |
2000-10-24 |
