Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for multiphase chemical mechanical polishing

Method and apparatus for multiphase chemical mechanical polishing

US Patent 6468135 · Granted Oct 22, 2002

Estimated economic value: $16,060,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Optimized scheduling based on sensitivity data2012
Photoresist trimming process2011
Photoresist trimming process2011
Method to etch chrome for photomask fabrication2010
Photoresist trimming process2007
Pattern compensation techniques for charged particle lithographic masks2006
CD uniformity of chrome etch to photomask process2006
Method to prevent leaving residual metal in CMP process of metal interconnect2003
Method to prevent leaving residual metal in CMP process of metal interconnect2003
Prevention of slurry build-up within wafer topography during polishing2002
Off-concentric polishing system design2002
Method for homogenizing device parameters through photoresist planarization2002