| 6387810 |
Method for homogenizing device parameters through photoresist planarization |
Zhong-Xiang He, Cuc K. Huynh, Michael P. McMahon |
2002-05-14 |
| 6352596 |
Post CMP cleaning method using a brush cleaner with torque monitor |
Timothy Scott Bullard, Cuc K. Huynh, Theodore G. van Kessel, David Walker |
2002-03-05 |
| 6299515 |
CMP apparatus with built-in slurry distribution and removal |
Cuc K. Huynh, Steven J. Messier, David Walker |
2001-10-09 |
| 6269510 |
Post CMP clean brush with torque monitor |
Timothy Scott Bullard, Cuc K. Huynh, Theodore G. van Kessel, David Walker |
2001-08-07 |
| 6179693 |
In-situ/self-propelled polishing pad conditioner and cleaner |
Cuc K. Huynh, David Walker |
2001-01-30 |
| 6135865 |
CMP apparatus with built-in slurry distribution and removal |
Cuc K. Huynh, Steven J. Messier, David Walker |
2000-10-24 |
