Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12334351 | Molybdenum deposition | Jeong-Seok Na, Yao-Tsung HSIEH, Patrick A. Van Cleemput | 2025-06-17 |
| 11069535 | Atomic layer etch of tungsten for enhanced tungsten deposition fill | Keren Jacobs Kanarik, Samantha Tan, Anand Chandrashekar, Teh-Tien Su, Wenbing Yang +2 more | 2021-07-20 |
| 10777453 | Low resistivity films containing molybdenum | Shruti Vivek Thombare, Raashina Humayun, Michal Danek, Joshua Collins, Hanna Bamnolker +3 more | 2020-09-15 |
| 10731250 | Depositing ruthenium layers in interconnect metallization | Do-Young Kim, Jeong-Seok Na, Raashina Humayun, Michal Danek | 2020-08-04 |
| 10510590 | Low resistivity films containing molybdenum | Shruti Vivek Thombare, Raashina Humayun, Michal Danek, Joshua Collins, Hanna Bamnolker +3 more | 2019-12-17 |
| 10438847 | Manganese barrier and adhesion layers for cobalt | Jeong-Seok Na, Raashina Humayun, Michal Danek, Kaihan Ashtiani | 2019-10-08 |
| 10283404 | Selective deposition of WCN barrier/adhesion layer for interconnect | Jeong-Seok Na, Megha Rathod, Raashina Humayun | 2019-05-07 |
| 10229826 | Systems and methods for forming low resistivity metal contacts and interconnects by reducing and removing metallic oxide | Raihan M. Tarafdar, Shruti Vivek Thombare, Jeong-Seok Na, Raashina Humayun | 2019-03-12 |
| 9972504 | Atomic layer etching of tungsten for enhanced tungsten deposition fill | Keren Jacobs Kanarik, Samantha Tan, Anand Chandrashekar, Teh-Tien Su, Wenbing Yang +2 more | 2018-05-15 |
| 9748137 | Method for void-free cobalt gap fill | Jeong-Seok Na, Raihan M. Tarafdar, Raashina Humayun, Michal Danek | 2017-08-29 |
| 9362163 | Methods and apparatuses for atomic layer cleaning of contacts and vias | Michal Danek, Juwen Gao, Aaron R. Fellis, Francisco Juarez | 2016-06-07 |
| 8617348 | Modulating etch selectivity and etch rate of silicon nitride thin films | Xinye Liu | 2013-12-31 |
| 8187486 | Modulating etch selectivity and etch rate of silicon nitride thin films | Xinye Liu | 2012-05-29 |
| 7977249 | Methods for removing silicon nitride and other materials during fabrication of contacts | Xinye Liu, Yu-Chi Yang | 2011-07-12 |