Issued Patents All Time
Showing 26–50 of 54 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10600678 | Self-aligned isotropic etch of pre-formed vias and plugs for back end of line (BEOL) interconnects | Charles H. Wallace, Elliot N. Tan, Swaminathan Sivakumar | 2020-03-24 |
| 10559529 | Pitch division patterning approaches with increased overlay margin for back end of line (BEOL) interconnect fabrication and structures resulting therefrom | Charles H. Wallace, Leonard P. GULER, Manish Chandhok | 2020-02-11 |
| 10459338 | Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging | Eungnak Han, Swaminathan Sivakumar, Ernisse Putna | 2019-10-29 |
| 10338474 | Underlying absorbing or conducting layer for Ebeam direct write (EBDW) lithography | Shakul Tandon, Yan Borodovsky, Charles H. Wallace | 2019-07-02 |
| 10325814 | Patterning of vertical nanowire transistor channel and gate with directed self assembly | Swaminathan Sivakumar | 2019-06-18 |
| 10319625 | Metal via processing schemes with via critical dimension (CD) control for back end of line (BEOL) interconnects and the resulting structures | Mohit K. HARAN, Charles H. Wallace, Robert M. Bigwood, Deepak S. Rao, Alexander F. Kaplan | 2019-06-11 |
| 10297467 | Self-aligned via and plug patterning for back end of line (BEOL) interconnects | Charles H. Wallace | 2019-05-21 |
| 10211088 | Self-aligned isotropic etch of pre-formed vias and plugs for back end of line (BEOL) interconnects | Charles H. Wallace, Elliot N. Tan, Swaminathan Sivakumar | 2019-02-19 |
| 10204830 | Previous layer self-aligned via and plug patterning for back end of line (BEOL) interconnects | Charles H. Wallace, Elliot N. Tan, Swaminathan Sivakumar | 2019-02-12 |
| 9793159 | Previous layer self-aligned via and plug patterning for back end of line (BEOL) interconnects | Charles H. Wallace, Elliot N. Tan, Swaminathan Sivakumar | 2017-10-17 |
| 9793163 | Subtractive self-aligned via and plug patterning for back end of line (BEOL) interconnects | Robert L. Bristol, Florian Gstrein, Richard E. Schenker, Charles H. Wallace, Hui Jae Yoo | 2017-10-17 |
| 9666451 | Self-aligned via and plug patterning for back end of line (BEOL) interconnects | Charles H. Wallace | 2017-05-30 |
| 9653576 | Patterning of vertical nanowire transistor channel and gate with directed self assembly | Swaminathan Sivakumar | 2017-05-16 |
| 9625815 | Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and plugging | Eungnak Han, Swaminathan Sivakumar, Ernisse Putna | 2017-04-18 |
| 9530688 | Directed self assembly of block copolymers to form vias aligned with interconnects | Swaminathan Sivakumar, Robert L. Bristol | 2016-12-27 |
| 9431518 | Patterning of vertical nanowire transistor channel and gate with directed self assembly | Swaminathan Sivakumar | 2016-08-30 |
| 9285682 | Pre-patterned hard mask for ultrafast lithographic imaging | Robert L. Bristol, Charles H. Wallace | 2016-03-15 |
| 9269630 | Patterning of vertical nanowire transistor channel and gate with directed self assembly | Swaminathan Sivakumar | 2016-02-23 |
| 9153477 | Directed self assembly of block copolymers to form vias aligned with interconnects | Swaninathan Sivakumar, Robert L. Bristol | 2015-10-06 |
| 9054215 | Patterning of vertical nanowire transistor channel and gate with directed self assembly | Swaminathan Sivakumar | 2015-06-09 |
| 9005875 | Pre-patterned hard mask for ultrafast lithographic imaging | Robert L. Bristol, Charles H. Wallace | 2015-04-14 |
| 8959465 | Techniques for phase tuning for process optimization | Shem Ogadhoh, Swaminathan Sivakumar, Seongtae Jeong | 2015-02-17 |
| 7820550 | Negative tone double patterning method | Charles H. Wallace, Swaminathan Sivakumar | 2010-10-26 |
| 7816061 | Lithography masks for improved line-end patterning | Richard E. Schenker, Swaminathan Sivakumar, Sven Henrichs | 2010-10-19 |
| 7759028 | Sub-resolution assist features | Charles H. Wallace, Swaminathan Sivakumar | 2010-07-20 |