AG

Alois Gutmann

Infineon Technologies Ag: 37 patents #145 of 7,486Top 2%
IBM: 7 patents #14,640 of 70,183Top 25%
CM Chartered Semiconductor Manufacturing: 4 patents #148 of 840Top 20%
Samsung: 4 patents #25,854 of 75,807Top 35%
📍 Poughkeepsie, NY: #99 of 1,613 inventorsTop 7%
🗺 New York: #2,841 of 115,490 inventorsTop 3%
Overall (All Time): #86,830 of 4,157,543Top 3%
38
Patents All Time

Issued Patents All Time

Showing 26–38 of 38 patents

Patent #TitleCo-InventorsDate
7674350 Feature dimension control in a manufacturing process Haoren Zhuang, Matthias Lipinski, Chandrasekhar Sarma, Jingyu Lian 2010-03-09
7666800 Feature patterning methods Sajan Marokkey, Klaus Herold, Chandrasekhar Sarma 2010-02-23
7629225 Methods of manufacturing semiconductor devices and structures thereof Markus Naujok, Hermann Wendt, Muhammed Shafi Pallachalil 2009-12-08
7615840 Device performance improvement using flowfill as material for isolation structures Roland Hampp, Jin-Ping Han, O Sung Kwon 2009-11-10
7541288 Methods of forming integrated circuit structures using insulator deposition and insulator gap filling techniques Jun Jung Kim, Ja-Hum Ku, Jae-eon Park, Sunfei Fang, O-Sung Kwon +2 more 2009-06-02
7298009 Semiconductor method and device with mixed orientation substrate Jiang Yan, Chun-Yung Sung, Danny Pak-Chum Shum 2007-11-20
7030506 Mask and method for using the mask in lithographic processing Syed Zaidi, Gary Williams 2006-04-18
6954002 System and method of enhancing alignment marks Shoaib Zaidi, Gary Williams 2005-10-11
6670646 Mask and method for patterning a semiconductor wafer Zhijian Lu, Shahid Butt 2003-12-30
6521542 Method for forming dual damascene structure Mike Armacost, Bruno Spuler, Gabriela Brase 2003-02-18
6420101 Method of reducing post-development defects in and around openings formed in photoresist by use of non-patterned exposure Zhijian Lu, Alan C. Thomas, Kuang-Jung Chen, Margaret C. Lawson 2002-07-16
6379869 Method of improving the etch resistance of chemically amplified photoresists by introducing silicon after patterning Uwe Schroeder, Gerhard Kunkel, Bruno Spuler 2002-04-30
6372408 Method of reducing post-development defects in and around openings formed in photoresist by use of multiple development/rinse cycles Zhijian Lu, Alan C. Thomas, Kuang-Jung Chen, Margaret C. Lawson 2002-04-16