EP

Elmar Platzgummer

IG Ims Nanofabrication Gmbh: 41 patents #1 of 35Top 3%
CS Carl Zeiss Sms: 5 patents #11 of 118Top 10%
IS Ims-Ionen Mikrofabrikationas Systeme: 4 patents #4 of 31Top 15%
📍 Wien, AT: #16 of 3,624 inventorsTop 1%
Overall (All Time): #52,330 of 4,157,543Top 2%
51
Patents All Time

Issued Patents All Time

Showing 26–50 of 51 patents

Patent #TitleCo-InventorsDate
8304749 Charged-particle exposure apparatus with electrostatic zone plate Stefan Cernusca 2012-11-06
8278635 Global point spreading function in multi-beam patterning Heinrich Fragner, Stefan Cernusca 2012-10-02
8258488 Compensation of dose inhomogeneity and image distortion Heinrich Fragner, Stefan Cernusca 2012-09-04
8222621 Method for maskless particle-beam exposure Heinrich Fragner, Robert Nowak, Adrian Bürli 2012-07-17
8198601 Method for producing a multi-beam deflector array device having electrodes Heinrich Fragner 2012-06-12
8183543 Multi-beam source 2012-05-22
8115183 Method for maskless particle-beam exposure 2012-02-14
8057972 Constant current multi-beam patterning Heinrich Fragner, Adrian Bürli 2011-11-15
8049189 Charged particle system Herbert Buschbeck, Gerhard Stengl, Herbert Vonach 2011-11-01
8026495 Charged particle beam exposure system 2011-09-27
7781748 Particle-beam exposure apparatus with overall-modulation of a patterned beam 2010-08-24
7777201 Method for maskless particle-beam exposure Heinrich Fragner 2010-08-17
7763851 Particle-beam apparatus with improved wien-type filter 2010-07-27
7737422 Charged-particle exposure apparatus Stefan Cernusca, Gerhard Stengl 2010-06-15
7714298 Pattern definition device having distinct counter-electrode array plate 2010-05-11
7687783 Multi-beam deflector array device for maskless particle-beam processing Hans Loschner, Samuel Kvasnica, Reinhard Springer, Mathias Irmscher, Florian Letzkus +1 more 2010-03-30
7598499 Charged-particle exposure apparatus 2009-10-06
7388217 Particle-optical projection system Herbert Buschbeck, Gertraud Lammer, Alfred Chalupka, Robert Nowak, Gerhard Stengl 2008-06-17
7368738 Advanced pattern definition for particle-beam exposure 2008-05-06
7276714 Advanced pattern definition for particle-beam processing Stefan Cernusca 2007-10-02
7214951 Charged-particle multi-beam exposure apparatus Gerhard Stengl, Hans Loschner 2007-05-08
7033647 Method of synthesising carbon nano tubes Xinhe Tang, Klaus Mauthner, Ernst Hammel, Hans Loschner, Gerhard Stengl 2006-04-25
6989546 Particle multibeam lithography Hans Loschner, Gerhard Stengl, Herbert Vonach 2006-01-24
6909103 Ion irradiation of a target at very high and very low kinetic ion energies Gerhard Stengl, Hans Loeschner 2005-06-21
6858118 Apparatus for enhancing the lifetime of stencil masks Hans Loschner, Gerhard Stengl 2005-02-22