Issued Patents All Time
Showing 1–25 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8368030 | Charged particle beam exposure system and beam manipulating arrangement | Elmar Platzgummer | 2013-02-05 |
| 8368015 | Particle-optical system | Elmar Platzgummer, Helmut Falkner | 2013-02-05 |
| 8049189 | Charged particle system | Herbert Buschbeck, Elmar Platzgummer, Herbert Vonach | 2011-11-01 |
| 7772574 | Pattern lock system for particle-beam exposure apparatus | Herbert Buschbeck, Robert Nowak | 2010-08-10 |
| 7737422 | Charged-particle exposure apparatus | Elmar Platzgummer, Stefan Cernusca | 2010-06-15 |
| 7436120 | Compensation of magnetic fields | Herbert Buschbeck | 2008-10-14 |
| 7388217 | Particle-optical projection system | Herbert Buschbeck, Gertraud Lammer, Alfred Chalupka, Robert Nowak, Elmar Platzgummer | 2008-06-17 |
| 7214951 | Charged-particle multi-beam exposure apparatus | Elmar Platzgummer, Hans Loschner | 2007-05-08 |
| 7199373 | Particle-optic electrostatic lens | Herbert Buschbeck, Gertraud Lammer | 2007-04-03 |
| 7033647 | Method of synthesising carbon nano tubes | Xinhe Tang, Klaus Mauthner, Ernst Hammel, Hans Loschner, Elmar Platzgummer | 2006-04-25 |
| 6989546 | Particle multibeam lithography | Hans Loschner, Herbert Vonach, Elmar Platzgummer | 2006-01-24 |
| 6909103 | Ion irradiation of a target at very high and very low kinetic ion energies | Elmar Platzgummer, Hans Loeschner | 2005-06-21 |
| 6858118 | Apparatus for enhancing the lifetime of stencil masks | Elmar Platzgummer, Hans Loschner | 2005-02-22 |
| 6768125 | Maskless particle-beam system for exposing a pattern on a substrate | Elmar Platzgummer, Hans Loeschner, Herbert Vonach, Alfred Chalupka, Gertraud Lammer +3 more | 2004-07-27 |
| 6661015 | Pattern lock system | Alfred Chalupka, Hans Loschner, Robert Nowak, Stefan Eder | 2003-12-09 |
| 6326632 | Particle-optical imaging system for lithography purposes | Herbert Buschbeck, Alfred Chalupka, Gertraud Lammer, Hans Loeschner | 2001-12-04 |
| 6194730 | Electrostatic lens | Alfred Chalupka | 2001-02-27 |
| 5874739 | Arrangement for shadow-casting lithography | Herbert Buschbeck, Alfred Chalupka, Hans Loeschner, Herbert Vonach | 1999-02-23 |
| 5869838 | Field composable electrostatic lens system | — | 1999-02-09 |
| 5801388 | Particle beam, in particular ionic optic imaging system | Alfred Chalupka, Herbert Vonach | 1998-09-01 |
| 5742062 | Arrangement for masked beam lithography by means of electrically charged particles | Alfred Chalupka, Herbert Vonach, Hans Loeschner | 1998-04-21 |
| 5693950 | Projection system for charged particles | Alfred Chalupka, Herbert Vonach | 1997-12-02 |
| 5436460 | Ion-optical imaging system | Alfred Chalupka, Herbert Vonach | 1995-07-25 |
| 5378917 | Particle-beam imaging system | Alfred Chalupka, Herbert Vonach | 1995-01-03 |
| 5350924 | Ion-optical imaging system | Alfred Chalupka | 1994-09-27 |