Issued Patents All Time
Showing 1–25 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12154756 | Beam pattern device having beam absorber structure | Stefan Eder-Kapl | 2024-11-26 |
| 12040157 | Pattern data processing for programmable direct-write apparatus | Christoph Spengler, Michael Haberler | 2024-07-16 |
| 11569064 | Method for irradiating a target using restricted placement grids | Christoph Spengler, Wolf Naetar | 2023-01-31 |
| 10840054 | Charged-particle source and method for cleaning a charged-particle source using back-sputtering | Mattia Capriotti, Christoph Spengler | 2020-11-17 |
| 10651010 | Non-linear dose- and blur-dependent edge placement correction | Christoph Spengler, Wolf Naetar | 2020-05-12 |
| 10522329 | Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus | Christoph Spengler, Wolf Naetar | 2019-12-31 |
| 10410831 | Multi-beam writing using inclined exposure stripes | — | 2019-09-10 |
| 10325757 | Advanced dose-level quantization of multibeam-writers | Christoph Spengler, Hanns Peter Petsch | 2019-06-18 |
| 10325756 | Method for compensating pattern placement errors caused by variation of pattern exposure density in a multi-beam writer | — | 2019-06-18 |
| 9799487 | Bi-directional double-pass multi-beam writing | — | 2017-10-24 |
| 9653263 | Multi-beam writing of pattern areas of relaxed critical dimension | Klaus Schiessl | 2017-05-16 |
| 9568907 | Correction of short-range dislocations in a multi-beam writer | Christoph Spengler, Markus Wagner, Samuel Kvasnica | 2017-02-14 |
| 9520268 | Compensation of imaging deviations in a particle-beam writer using a convolution kernel | — | 2016-12-13 |
| 9495499 | Compensation of dose inhomogeneity using overlapping exposure spots | Rafael Reiter | 2016-11-15 |
| 9443699 | Multi-beam tool for cutting patterns | Hans Loschner | 2016-09-13 |
| 9373482 | Customizing a particle-beam writer using a convolution kernel | — | 2016-06-21 |
| 9269543 | Compensation of defective beamlets in a charged-particle multi-beam exposure tool | Rafael Reiter, Klaus Schiessel | 2016-02-23 |
| 9099277 | Pattern definition device having multiple blanking arrays | — | 2015-08-04 |
| 9093201 | High-voltage insulation device for charged-particle optical apparatus | Andreas Chylik, Gerald Kratzert, Roman Oberleitner | 2015-07-28 |
| 9053906 | Method for charged-particle multi-beam exposure | — | 2015-06-09 |
| 8563942 | Multi-beam deflector array means with bonded electrodes | — | 2013-10-22 |
| 8546767 | Pattern definition device with multiple multibeam array | Hans Loeschner | 2013-10-01 |
| 8378320 | Method for multi-beam exposure on a target | — | 2013-02-19 |
| 8368015 | Particle-optical system | Gerhard Stengl, Helmut Falkner | 2013-02-05 |
| 8368030 | Charged particle beam exposure system and beam manipulating arrangement | Gerhard Stengl | 2013-02-05 |