Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9443699 | Multi-beam tool for cutting patterns | Elmar Platzgummer | 2016-09-13 |
| 7687783 | Multi-beam deflector array device for maskless particle-beam processing | Elmar Platzgummer, Samuel Kvasnica, Reinhard Springer, Mathias Irmscher, Florian Letzkus +1 more | 2010-03-30 |
| 7214951 | Charged-particle multi-beam exposure apparatus | Gerhard Stengl, Elmar Platzgummer | 2007-05-08 |
| 7033647 | Method of synthesising carbon nano tubes | Xinhe Tang, Klaus Mauthner, Ernst Hammel, Elmar Platzgummer, Gerhard Stengl | 2006-04-25 |
| 6989546 | Particle multibeam lithography | Gerhard Stengl, Herbert Vonach, Elmar Platzgummer | 2006-01-24 |
| 6858118 | Apparatus for enhancing the lifetime of stencil masks | Elmar Platzgummer, Gerhard Stengl | 2005-02-22 |
| 6835508 | Large-area membrane mask and method for fabricating the mask | Jörg Butschke, Albrecht Ehrmann, Ernst Haugeneder, Frank-Michael Kamm, Florian Letzkus +1 more | 2004-12-28 |
| 6661015 | Pattern lock system | Alfred Chalupka, Gerhard Stengl, Robert Nowak, Stefan Eder | 2003-12-09 |
| 6455429 | Method of producing large-area membrane masks | Jörg Butschke, Florian Letzkus, Elisabeth Penteker, Reinhard Springer, Bernd Hofflinger | 2002-09-24 |
| 6419752 | Structuring device for processing a substrate | Igor Shvets, Ivajlo Rangelow, Peter Güthner, Jens Voight, Guido Mariotto | 2002-07-16 |
| 6296700 | Method of producing a structured layer | Uwe Sleytr, Dietmar Pum | 2001-10-02 |
| 6156217 | Method for the purpose of producing a stencil mask | Ernst Hammel, Ivaylo W. Rangelow | 2000-12-05 |
| 6136160 | Process for producing a carbon film on a substrate | Pavol Hrkut, Peter Hudek, Ivaylo W. Rangelow | 2000-10-24 |
| 5876880 | Process for producing a structured mask | Herbert Vonach, Alfred Chalupka | 1999-03-02 |
| 5672449 | Silicon membrane and method of making same | Feng Shi, Ivaylo W. Rangelow | 1997-09-30 |
| 4967088 | Method and apparatus for image alignment in ion lithography | Gerhard Stengl, Ernst Hammell, Hilton F. Glavish | 1990-10-30 |
| 4924104 | Ion beam apparatus and method of modifying substrate | Gerhard Stengl | 1990-05-08 |
| 4916322 | Arrangement for stabilizing an irradiated mask | Hilton F. Glavish, Gerhard Stengel, Alfred Chalupka | 1990-04-10 |
| 4891547 | Particle or radiation beam mask and process for making same | Gerhard Stengl | 1990-01-02 |
| 4859857 | Ion-projection apparatus and method of operating same | Gerhard Stengl, Peter Wolf | 1989-08-22 |
| 4835392 | Ion-projection apparatus | Gerhard Stengl | 1989-05-30 |
| 4823011 | Ion-projection lithographic apparatus with means for aligning the mask image with the substrate | Gerhard Stengl | 1989-04-18 |
| 4780382 | Process for making a transmission mask | Gerhard Stengl | 1988-10-25 |
| 4775797 | Method of stabilizing a mask | Gerhard Stengl | 1988-10-04 |
| 4370556 | Self-supporting mask, method for production as well as use of same | Gerhard Stengl | 1983-01-25 |