HL

Hans Loeschner

IS Ims-Ionen Mikrofabrikationas Systeme: 3 patents #6 of 31Top 20%
IG Ims Nanofabrication Gmbh: 2 patents #12 of 35Top 35%
📍 Wien, AT: #395 of 3,624 inventorsTop 15%
Overall (All Time): #861,291 of 4,157,543Top 25%
6
Patents All Time

Issued Patents All Time

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
8546767 Pattern definition device with multiple multibeam array Elmar Platzgummer 2013-10-01
6909103 Ion irradiation of a target at very high and very low kinetic ion energies Elmar Platzgummer, Gerhard Stengl 2005-06-21
6768125 Maskless particle-beam system for exposing a pattern on a substrate Elmar Platzgummer, Gerhard Stengl, Herbert Vonach, Alfred Chalupka, Gertraud Lammer +3 more 2004-07-27
6326632 Particle-optical imaging system for lithography purposes Herbert Buschbeck, Alfred Chalupka, Gertraud Lammer, Gerhard Stengl 2001-12-04
5874739 Arrangement for shadow-casting lithography Herbert Buschbeck, Alfred Chalupka, Gerhard Stengl, Herbert Vonach 1999-02-23
5742062 Arrangement for masked beam lithography by means of electrically charged particles Gerhard Stengl, Alfred Chalupka, Herbert Vonach 1998-04-21