Patent Leaderboard
USPTO Patent Rankings Data through Sept 30, 2025
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Viorel Ontalus — 61 Patents

IBM: 42 patents #2,200 of 70,183Top 4%
Globalfoundries: 14 patents #253 of 4,424Top 6%
GUGlobalfoundries U.S.: 10 patents #67 of 665Top 15%
Unionville, CT: #2 of 92 inventorsTop 3%
Connecticut: #317 of 34,797 inventorsTop 1%
Overall (All Time): #37,665 of 4,157,543Top 1%
61 Patents All Time

Issued Patents All Time

Showing 26–50 of 61 patents

Patent #TitleCo-InventorsDate
9059292 Source and drain doping profile control employing carbon-doped semiconductor material Pranita Kulkarni, Donald R. Wall, Zhengmao Zhu 2015-06-16
9041119 Forming CMOS with close proximity stressors Desmond J. Donegan, Jr., Abhishek Dube, Steven P. Jones, Jophy Stephen Koshy 2015-05-26
9013008 Semiconductor structures and methods of manufacturing the same Xi Li 2015-04-21
9006052 Self aligned device with enhanced stress and methods of manufacture Judson R. Holt, Keith H. Tabakman 2015-04-14
8993395 Minimizing leakage current and junction capacitance in CMOS transistors by utilizing dielectric spacers Dureseti Chidambarrao, Ramachandran Muralidhar, Philip J. Oldiges 2015-03-31
8940595 Faceted intrinsic epitaxial buffer layer for reducing short channel effects while maximizing channel stress levels Bhupesh Chandra, Paul Chang, Gregory G. Freeman, Dechao Guo, Judson R. Holt +6 more 2015-01-27
8921939 Stressed channel FET with source/drain buffers Jeffrey B. Johnson, Ramachandran Muralidhar, Philip J. Oldiges, Kai Xiu 2014-12-30
8895384 Gate structures and methods of manufacture Unoh Kwon, Ramachandran Muralidhar 2014-11-25
8779525 Method for growing strain-inducing materials in CMOS circuits in a gate first flow Bo Bai, Linda Black, Abhishek Dube, Judson R. Holt, Kathryn T. Schonenberg +2 more 2014-07-15
8741725 Butted SOI junction isolation structures and devices and method of fabrication Jeffrey B. Johnson, Shreesh Narasimha, Hasan M. Nayfeh, Robert R. Robison 2014-06-03
8618617 Field effect transistor device Kevin K. Chan, Abhishek Dube, Eric C. Harley, Judson R. Holt, Kathryn T. Schonenberg +3 more 2013-12-31
8604564 Semiconductor structures and methods of manufacturing the same Xi Li 2013-12-10
8551845 Structure and method for increasing strain in a device Kevin K. Chan, Abhishek Dube 2013-10-08
8546219 Reducing performance variation of narrow channel devices Deepal Wehella-Gamage 2013-10-01
8541814 Minimizing leakage current and junction capacitance in CMOS transistors by utilizing dielectric spacers Dureseti Chidambarrao, Ramachandran Muralidhar, Philip J. Oldiges 2013-09-24
8513122 Method and structure for differential silicide and recessed or raised source/drain to improve field effect transistor Christian Lavoie, Ahmet S. Ozcan 2013-08-20
8492234 Field effect transistor device Kevin K. Chan, Abhishek Dube, Eric C. Harley, Judson R. Holt, Kathryn T. Schonenberg +3 more 2013-07-23
8490029 Method of fabricating a device using low temperature anneal processes, a device and design structure Anthony G. Domenicucci, Terence L. Kane, Shreesh Narasimha, Karen A. Nummy, Yun-Yu Wang 2013-07-16
8482076 Method and structure for differential silicide and recessed or raised source/drain to improve field effect transistor Christian Lavoie, Ahmet S. Ozcan 2013-07-09
8426265 Method for growing strain-inducing materials in CMOS circuits in a gate first flow Bo Bai, Linda Black, Abhishek Dube, Judson R. Holt, Kathryn T. Schonenberg +2 more 2013-04-23
8421191 Monolayer dopant embedded stressor for advanced CMOS Kevin K. Chan, Abhishek Dube, Judson R. Holt, Jinghong Li, Joseph S. Newbury +2 more 2013-04-16
8394712 Cavity-free interface between extension regions and embedded silicon-carbon alloy source/drain regions Abhishek Dube 2013-03-12
8378424 Semiconductor structure having test and transistor structures Abhishek Dube, Kathryn T. Schonenberg, Zhengmao Zhu 2013-02-19
8361847 Stressed channel FET with source/drain buffers Jeffrey B. Johnson, Ramachandran Muralidhar, Philip J. Oldiges, Kai Xiu 2013-01-29
8343825 Reducing dislocation formation in semiconductor devices through targeted carbon implantation Anthony G. Domenicucci, Shreesh Narasimha, Karen A. Nummy, Yun-Yu Wang 2013-01-01