Issued Patents All Time
Showing 51–71 of 71 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7960096 | Sublithographic patterning method incorporating a self-aligned single mask process | David W. Abraham, Steven E. Steen, Francois Pagette | 2011-06-14 |
| 7943480 | Sub-lithographic dimensioned air gap formation and related structure | Daniel C. Edelstein, David V. Horak, Elbert E. Huang, Wai-Kin Li, Anthony D. Lisi +2 more | 2011-05-17 |
| 7935637 | Resist stripping methods using backfilling material layer | Sivananda K. Kanakasabapathy, Ying Zhang | 2011-05-03 |
| 7927995 | Adopting feature of buried electrically conductive layer in dielectrics for electrical anti-fuse application | Chih-Chao Yang, Lawrence A. Clevenger, Timothy J. Dalton, Louis C. Hsu | 2011-04-19 |
| 7914970 | Mixed lithography with dual resist and a single pattern transfer | Michael A. Guillorn, Balasubramanian S. Pranatharthi Haran, Jyotica V. Patel | 2011-03-29 |
| 7816275 | Gate patterning of nano-channel devices | Sarunya Bangsaruntip, Guy M. Cohen, Sebastian U. Engelmann, Lidija Sekaric, Qingyun Yang +1 more | 2010-10-19 |
| 7811926 | Multilayer hardmask scheme for damage-free dual damascene processing of SiCOH dielectrics | Stephen M. Gates, Timothy J. Dalton | 2010-10-12 |
| 7767587 | Method of forming an interconnection structure in a organosilicate glass having a porous layer with higher carbon content located between two lower carbon content non-porous layers | Timothy J. Dalton | 2010-08-03 |
| 7739218 | Systems and methods for building and implementing ontology-based information resources | Juan Fernando Argüello, Youssef Drissi, Ijeoma M. Nnebe, Daby Mousse Sow | 2010-06-15 |
| 7504727 | Semiconductor interconnect structure utilizing a porous dielectric material as an etch stop layer between adjacent non-porous dielectric materials | Timothy J. Dalton | 2009-03-17 |
| 7486845 | Waveguide polarization beam splitters and method of fabricating a waveguide wire-grid polarization beam splitter | Charles T. Black, Gian-Luca Bona, Timothy J. Dalton, Roland Germann, Maurice McGlashan-Powell +2 more | 2009-02-03 |
| 7439174 | Multilayer hardmask scheme for damage-free dual damascene processing of SiCOH dielectrics | Timothy J. Dalton, Stephen M. Gates | 2008-10-21 |
| 7435671 | Trilayer resist scheme for gate etching applications | Timothy J. Dalton, Ying Zhang | 2008-10-14 |
| 7435676 | Dual damascene process flow enabling minimal ULK film modification and enhanced stack integrity | Timothy J. Dalton, Satyanarayana V. Nitta | 2008-10-14 |
| 7402463 | Adopting feature of buried electrically conductive layer in dielectrics for electrical anti-fuse application | Chih-Chao Yang, Lawrence A. Clevenger, Timothy J. Dalton, Louis C. Hsu | 2008-07-22 |
| 7371461 | Multilayer hardmask scheme for damage-free dual damascene processing of SiCOH dielectrics | Stephen M. Gates, Timothy J. Dalton | 2008-05-13 |
| 7352064 | Multiple layer resist scheme implementing etch recipe particular to each layer | Timothy J. Dalton, Raymond Joy, Yi-Hsiung Lin, Chun Hui Low | 2008-04-01 |
| 7298935 | Waveguide polarization beam splitters and method of fabricating a waveguide wire-grid polarization beam splitter | Charles T. Black, Gian-Luca Bona, Timothy J. Dalton, Roland Germann, Maurice McGlashan-Powell +2 more | 2007-11-20 |
| 7282441 | De-fluorination after via etch to preserve passivation | Timothy J. Dalton | 2007-10-16 |
| 7253116 | High ion energy and reative species partial pressure plasma ash process | Timothy J. Dalton | 2007-08-07 |
| 7196014 | System and method for plasma induced modification and improvement of critical dimension uniformity | Timothy J. Dalton, Ronald Della Guardia | 2007-03-27 |