GC

Guy M. Cohen

IBM: 258 patents #102 of 70,183Top 1%
SI Simplehuman: 22 patents #11 of 60Top 20%
SS Saifun Semiconductors: 10 patents #6 of 35Top 20%
Globalfoundries: 9 patents #393 of 4,424Top 9%
KL Kla-Tencor: 8 patents #185 of 1,394Top 15%
NO Novelsat: 3 patents #2 of 10Top 20%
KT King Abdulaziz City For Science And Technology: 3 patents #78 of 573Top 15%
RU Ramot At Tel-Aviv University: 2 patents #229 of 1,095Top 25%
KL Kla: 2 patents #202 of 758Top 30%
Applied Materials: 1 patents #4,780 of 7,310Top 70%
SI Spansion Israel: 1 patents #12 of 24Top 50%
ET Elpis Technologies: 1 patents #31 of 121Top 30%
📍 Ossining, NY: #2 of 613 inventorsTop 1%
🗺 New York: #51 of 115,490 inventorsTop 1%
Overall (All Time): #1,097 of 4,157,543Top 1%
320
Patents All Time

Issued Patents All Time

Showing 301–320 of 320 patents

Patent #TitleCo-InventorsDate
6972250 Method and structure for ultra-low contact resistance CMOS formed by vertically self-aligned CoSi2 on raised source drain Si/SiGe device Cyril Cabral, Jr., Roy A. Carruthers, Kevin K. Chan, Jack O. Chu, Steven J. Koester +2 more 2005-12-06
6967377 Double-gate fet with planarized surfaces and self-aligned silicides Hon-Sum Philip Wong 2005-11-22
6963505 Method circuit and system for determining a reference voltage 2005-11-08
6946696 Self-aligned isolation double-gate FET Kevin K. Chan, Meikei Ieong, Ronnen Andrew Roy, Paul M. Solomon, Min Yang 2005-09-20
6774015 Strained silicon-on-insulator (SSOI) and method to form the same Silke Christiansen 2004-08-10
6759710 Self-aligned double-gate MOSFET by selective epitaxy and silicon wafer bonding techniques Kevin K. Chan, Yuan Taur, Hon-Sum Philip Wong 2004-07-06
6716708 Self-aligned silicide process utilizing ion implants for reduced silicon consumption and control of the silicide formation temperature and structure formed thereby Cyril Cabral, Jr., Kevin K. Chan, Kathryn Guarini, Christian Lavoie, Ronnen Andrew Roy +1 more 2004-04-06
6713827 Micro-structures and methods for their manufacture Steven A. Cordes, Joanna Rosner, Jeannine M. Trewhella 2004-03-30
6690072 Method and structure for ultra-low contact resistance CMOS formed by vertically self-aligned CoSi2 on raised source drain Si/SiGe device Cyril Cabral, Jr., Roy A. Carruthers, Kevin K. Chan, Jack O. Chu, Steven J. Koester +2 more 2004-02-10
6667528 Semiconductor-on-insulator lateral p-i-n photodetector with a reflecting mirror and backside contact and method for forming the same Kern Rim, Dennis L. Rogers, Jeremy D. Schaub, Min Yang 2003-12-23
6645861 Self-aligned silicide process for silicon sidewall source and drain contacts Cyril Cabral, Jr., Kevin K. Chan, Kathryn Guarini, Christian Lavoie, Paul M. Solomon +1 more 2003-11-11
6642115 Double-gate FET with planarized surfaces and self-aligned silicides Hon-Sum Philip Wong 2003-11-04
6562642 Micro-structures and methods for their manufacture Steven A. Cordes, Joanna Rosner, Jeannine M. Trewhella 2003-05-13
6555880 Self-aligned silicide process utilizing ion implants for reduced silicon consumption and control of the silicide formation temperature and structure formed thereby Cyril Cabral, Jr., Kevin K. Chan, Kathryn Guarini, Christian Lavoie, Ronnen Andrew Roy +1 more 2003-04-29
6503833 Self-aligned silicide (salicide) process for strained silicon MOSFET ON SiGe and structure formed thereby Atul Ajmera, Cyril Cabral, Jr., Roy A. Carruthers, Kevin K. Chan, Paul Kozlowski +3 more 2003-01-07
6475072 Method of wafer smoothing for bonding using chemo-mechanical polishing (CMP) Donald F. Canaperi, Jack O. Chu, Lijuan Huang, John A. Ott, Michael F. Lofaro 2002-11-05
6448131 Method for increasing the capacitance of a trench capacitor Cyril Cabral, Jr., Kevin K. Chan, Ramachandra Divakaruni, Christian Lavoie, Fenton R. McFeely 2002-09-10
6444578 Self-aligned silicide process for reduction of Si consumption in shallow junction and thin SOI electronic devices Cyril Cabral, Jr., Roy A. Carruthers, Kevin K. Chan, Kathryn Guarini, James M. E. Harper +2 more 2002-09-03
6365465 Self-aligned double-gate MOSFET by selective epitaxy and silicon wafer bonding techniques Kevin K. Chan, Yuan Taur, Hon-Sum Philip Wong 2002-04-02
6300218 Method for patterning a buried oxide thickness for a separation by implanted oxygen (simox) process Devendra K. Sadana 2001-10-09