Issued Patents All Time
Showing 51–60 of 60 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5633781 | Isolated sidewall capacitor having a compound plate electrode | Katherine L. Saenger | 1997-05-27 |
| 5585998 | Isolated sidewall capacitor with dual dielectric | William H. Ma, Katherine L. Saenger | 1996-12-17 |
| 5548470 | Characterization, modeling, and design of an electrostatic chuck with improved wafer temperature uniformity | Anwar Husain, Stephan Lassig, Kurt A. Olson, Anthony J. Ricci | 1996-08-20 |
| 5425810 | Removable gas injectors for use in chemical vapor deposition of aluminium oxide | Richard A. Conti, Donald L. Wilson, Justin W. Wong, Steven P. Zuhoski | 1995-06-20 |
| 5374481 | Polyemitter structure with improved interface control | Shwu-Jen Jeng, Jerzy Kanicki, Christopher C. Parks, Zu-Jean Tien | 1994-12-20 |
| 5313094 | Thermal dissipation of integrated circuits using diamond paths | Klaus D. Beyer, Chang-Ming Hsieh, Louis L. Hsu, Tsoring-Dih Yuan | 1994-05-17 |
| 5268069 | Safe method for etching silicon dioxide | Jonathan D. Chapple-Sokol, Richard A. Conti, Andrew H. Simon, Manu J. Tejwani | 1993-12-07 |
| 5266504 | Low temperature emitter process for high performance bipolar devices | Jeffrey L. Blouse, Jack O. Chu, Brian T. Cunningham, Jeffrey P. Gambino, Louis L. Hsu +2 more | 1993-11-30 |
| 5192708 | Sub-layer contact technique using in situ doped amorphous silicon and solid phase recrystallization | Klaus D. Beyer, Edward C. Fredericks, Louis L. Hsu, Christopher C. Parks | 1993-03-09 |
| 5134963 | LPCVD reactor for high efficiency, high uniformity deposition | Steven G. Barbee, Jonathan D. Chapple-Sokol, Richard A. Conti | 1992-08-04 |