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2008-10-21 |
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| 6905969 |
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2005-06-14 |
| 6774046 |
Method for minimizing the critical dimension growth of a feature on a semiconductor wafer |
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2004-08-10 |
| 6620335 |
Plasma etch reactor and method |
Stephen P. DeOrnellas, Leslie G. Jerde, Alferd Cofer, Robert C. Vail |
2003-09-16 |
| 6500314 |
Plasma etch reactor and method |
Stephen P. DeOrnellas, Leslie G. Jerde, Alferd Cofer, Robert C. Vail |
2002-12-31 |
| 6354240 |
Plasma etch reactor having a plurality of magnets |
Stephen P. DeOrnellas, Leslie G. Jerde, Alferd Cofer, Robert C. Vail |
2002-03-12 |
| 6046116 |
Method for minimizing the critical dimension growth of a feature on a semiconductor wafer |
Stephen P. DeOrnellas, Alfred Cofer, Leslie G. Jerde, Paritosh Rajora |
2000-04-04 |
| 5548470 |
Characterization, modeling, and design of an electrostatic chuck with improved wafer temperature uniformity |
Anwar Husain, David E. Kotecki, Stephan Lassig, Anthony J. Ricci |
1996-08-20 |
