LJ

Leslie G. Jerde

TE Tegal: 14 patents #3 of 53Top 6%
AT AT&T: 1 patents #10,626 of 18,772Top 60%
SB Silicon Valley Bank: 1 patents #13 of 56Top 25%
WC Western Electric Company: 1 patents #173 of 531Top 35%
Overall (All Time): #279,205 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7439188 Reactor with heated and textured electrodes and surfaces Stephen P. DeOrnellas, Kurt A. Olson 2008-10-21
7223699 Plasma etch reactor and method Stephen P. DeOrnellas, Alferd Cofer, Robert C. Vail, Kurt A. Olson 2007-05-29
6958295 Method for using a hard mask for critical dimension growth containment Stephen P. DeOrnellas, Alferd Cofer 2005-10-25
6951820 Method for using a hard mask for critical dimension growth containment Stephen P. DeOrnellas, Alferd Cofer 2005-10-04
6905969 Plasma etch reactor and method Stephen P. DeOrnellas, Alferd Cofer, Robert C. Vail, Kurt A. Olson 2005-06-14
6774046 Method for minimizing the critical dimension growth of a feature on a semiconductor wafer Stephen P. DeOrnellas, Alferd Cofer, Kurt A. Olson, Paritosh Rajora 2004-08-10
6620335 Plasma etch reactor and method Stephen P. DeOrnellas, Alferd Cofer, Robert C. Vail, Kurt A. Olson 2003-09-16
6500314 Plasma etch reactor and method Stephen P. DeOrnellas, Alferd Cofer, Robert C. Vail, Kurt A. Olson 2002-12-31
6486069 Cobalt silicide etch process and apparatus Steven Marks, Stephen P. DeOrnellas 2002-11-26
6406925 Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing Satish D. Athavale, John A. Meyer 2002-06-18
6391148 Cobalt silicide etch process and apparatus Steven Marks, Stephen P. DeOrnellas 2002-05-21
6354240 Plasma etch reactor having a plurality of magnets Stephen P. DeOrnellas, Alferd Cofer, Robert C. Vail, Kurt A. Olson 2002-03-12
6346428 Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing Satish D. Athavale, John A. Meyer 2002-02-12
6287975 Method for using a hard mask for critical dimension growth containment Stephen P. DeOrnellas, Alferd Cofer 2001-09-11
6046116 Method for minimizing the critical dimension growth of a feature on a semiconductor wafer Stephen P. DeOrnellas, Alfred Cofer, Kurt A. Olson, Paritosh Rajora 2000-04-04
4491499 Optical emission end point detector Earl R. Lory, Kevin A. Muething, Len Y. Tsou 1985-01-01
4253907 Anisotropic plasma etching Peter D. Parry 1981-03-03