Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7439188 | Reactor with heated and textured electrodes and surfaces | Stephen P. DeOrnellas, Kurt A. Olson | 2008-10-21 |
| 7223699 | Plasma etch reactor and method | Stephen P. DeOrnellas, Alferd Cofer, Robert C. Vail, Kurt A. Olson | 2007-05-29 |
| 6958295 | Method for using a hard mask for critical dimension growth containment | Stephen P. DeOrnellas, Alferd Cofer | 2005-10-25 |
| 6951820 | Method for using a hard mask for critical dimension growth containment | Stephen P. DeOrnellas, Alferd Cofer | 2005-10-04 |
| 6905969 | Plasma etch reactor and method | Stephen P. DeOrnellas, Alferd Cofer, Robert C. Vail, Kurt A. Olson | 2005-06-14 |
| 6774046 | Method for minimizing the critical dimension growth of a feature on a semiconductor wafer | Stephen P. DeOrnellas, Alferd Cofer, Kurt A. Olson, Paritosh Rajora | 2004-08-10 |
| 6620335 | Plasma etch reactor and method | Stephen P. DeOrnellas, Alferd Cofer, Robert C. Vail, Kurt A. Olson | 2003-09-16 |
| 6500314 | Plasma etch reactor and method | Stephen P. DeOrnellas, Alferd Cofer, Robert C. Vail, Kurt A. Olson | 2002-12-31 |
| 6486069 | Cobalt silicide etch process and apparatus | Steven Marks, Stephen P. DeOrnellas | 2002-11-26 |
| 6406925 | Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing | Satish D. Athavale, John A. Meyer | 2002-06-18 |
| 6391148 | Cobalt silicide etch process and apparatus | Steven Marks, Stephen P. DeOrnellas | 2002-05-21 |
| 6354240 | Plasma etch reactor having a plurality of magnets | Stephen P. DeOrnellas, Alferd Cofer, Robert C. Vail, Kurt A. Olson | 2002-03-12 |
| 6346428 | Method and apparatus for minimizing semiconductor wafer arcing during semiconductor wafer processing | Satish D. Athavale, John A. Meyer | 2002-02-12 |
| 6287975 | Method for using a hard mask for critical dimension growth containment | Stephen P. DeOrnellas, Alferd Cofer | 2001-09-11 |
| 6046116 | Method for minimizing the critical dimension growth of a feature on a semiconductor wafer | Stephen P. DeOrnellas, Alfred Cofer, Kurt A. Olson, Paritosh Rajora | 2000-04-04 |
| 4491499 | Optical emission end point detector | Earl R. Lory, Kevin A. Muething, Len Y. Tsou | 1985-01-01 |
| 4253907 | Anisotropic plasma etching | Peter D. Parry | 1981-03-03 |