| 7439188 |
Reactor with heated and textured electrodes and surfaces |
Leslie G. Jerde, Kurt A. Olson |
2008-10-21 |
| 7223699 |
Plasma etch reactor and method |
Leslie G. Jerde, Alferd Cofer, Robert C. Vail, Kurt A. Olson |
2007-05-29 |
| 6958295 |
Method for using a hard mask for critical dimension growth containment |
Leslie G. Jerde, Alferd Cofer |
2005-10-25 |
| 6951820 |
Method for using a hard mask for critical dimension growth containment |
Leslie G. Jerde, Alferd Cofer |
2005-10-04 |
| 6905969 |
Plasma etch reactor and method |
Leslie G. Jerde, Alferd Cofer, Robert C. Vail, Kurt A. Olson |
2005-06-14 |
| 6774046 |
Method for minimizing the critical dimension growth of a feature on a semiconductor wafer |
Alferd Cofer, Leslie G. Jerde, Kurt A. Olson, Paritosh Rajora |
2004-08-10 |
| 6620335 |
Plasma etch reactor and method |
Leslie G. Jerde, Alferd Cofer, Robert C. Vail, Kurt A. Olson |
2003-09-16 |
| 6521081 |
Deposition shield for a plasma reactor |
Robert Ditizio |
2003-02-18 |
| 6500314 |
Plasma etch reactor and method |
Leslie G. Jerde, Alferd Cofer, Robert C. Vail, Kurt A. Olson |
2002-12-31 |
| 6492280 |
Method and apparatus for etching a semiconductor wafer with features having vertical sidewalls |
Alferd Cofer, Paritosh Rajora |
2002-12-10 |
| 6486069 |
Cobalt silicide etch process and apparatus |
Steven Marks, Leslie G. Jerde |
2002-11-26 |
| 6410448 |
Plasma etch reactor and method for emerging films |
Alferd Cofer, Robert C. Vail |
2002-06-25 |
| 6391148 |
Cobalt silicide etch process and apparatus |
Steven Marks, Leslie G. Jerde |
2002-05-21 |
| 6360686 |
Plasma reactor with a deposition shield |
Robert Ditizio |
2002-03-26 |
| 6354240 |
Plasma etch reactor having a plurality of magnets |
Leslie G. Jerde, Alferd Cofer, Robert C. Vail, Kurt A. Olson |
2002-03-12 |
| 6287975 |
Method for using a hard mask for critical dimension growth containment |
Leslie G. Jerde, Alferd Cofer |
2001-09-11 |
| 6190496 |
Plasma etch reactor and method for emerging films |
Alferd Cofer, Robert C. Vail |
2001-02-20 |
| 6173674 |
Plasma reactor with a deposition shield |
Robert Ditizio |
2001-01-16 |
| 6170431 |
Plasma reactor with a deposition shield |
Robert Ditizio |
2001-01-09 |
| 6127277 |
Method and apparatus for etching a semiconductor wafer with features having vertical sidewalls |
Alferd Cofer, Paritosh Rajora |
2000-10-03 |
| 6048435 |
Plasma etch reactor and method for emerging films |
Alferd Cofer, Robert C. Vail |
2000-04-11 |
| 6046116 |
Method for minimizing the critical dimension growth of a feature on a semiconductor wafer |
Alfred Cofer, Leslie G. Jerde, Kurt A. Olson, Paritosh Rajora |
2000-04-04 |
| 6006694 |
Plasma reactor with a deposition shield |
Robert Ditizio |
1999-12-28 |
| 5672239 |
Integrated semiconductor wafer processing system |
— |
1997-09-30 |