Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7985688 | Notch stop pulsing process for plasma processing system | Tamarak Pandhumsoporn | 2011-07-26 |
| 7459100 | Methods and apparatus for sequentially alternating among plasma processes in order to optimize a substrate | Adrian Kiermasz, Tamarak Pandhumsoporn | 2008-12-02 |
| 7351664 | Methods for minimizing mask undercuts and notches for plasma processing system | Tamarak Pandhumsoporn, William Frederick Bosch | 2008-04-01 |
| 7223699 | Plasma etch reactor and method | Stephen P. DeOrnellas, Leslie G. Jerde, Robert C. Vail, Kurt A. Olson | 2007-05-29 |
| 6958295 | Method for using a hard mask for critical dimension growth containment | Stephen P. DeOrnellas, Leslie G. Jerde | 2005-10-25 |
| 6951820 | Method for using a hard mask for critical dimension growth containment | Stephen P. DeOrnellas, Leslie G. Jerde | 2005-10-04 |
| 6905969 | Plasma etch reactor and method | Stephen P. DeOrnellas, Leslie G. Jerde, Robert C. Vail, Kurt A. Olson | 2005-06-14 |
| 6774046 | Method for minimizing the critical dimension growth of a feature on a semiconductor wafer | Stephen P. DeOrnellas, Leslie G. Jerde, Kurt A. Olson, Paritosh Rajora | 2004-08-10 |
| 6620335 | Plasma etch reactor and method | Stephen P. DeOrnellas, Leslie G. Jerde, Robert C. Vail, Kurt A. Olson | 2003-09-16 |
| 6500314 | Plasma etch reactor and method | Stephen P. DeOrnellas, Leslie G. Jerde, Robert C. Vail, Kurt A. Olson | 2002-12-31 |
| 6492280 | Method and apparatus for etching a semiconductor wafer with features having vertical sidewalls | Stephen P. DeOrnellas, Paritosh Rajora | 2002-12-10 |
| 6410448 | Plasma etch reactor and method for emerging films | Stephen P. DeOrnellas, Robert C. Vail | 2002-06-25 |
| 6354240 | Plasma etch reactor having a plurality of magnets | Stephen P. DeOrnellas, Leslie G. Jerde, Robert C. Vail, Kurt A. Olson | 2002-03-12 |
| 6287975 | Method for using a hard mask for critical dimension growth containment | Stephen P. DeOrnellas, Leslie G. Jerde | 2001-09-11 |
| 6190496 | Plasma etch reactor and method for emerging films | Stephen P. DeOrnellas, Robert C. Vail | 2001-02-20 |
| 6127277 | Method and apparatus for etching a semiconductor wafer with features having vertical sidewalls | Stephen P. DeOrnellas, Paritosh Rajora | 2000-10-03 |
| 6048435 | Plasma etch reactor and method for emerging films | Stephen P. DeOrnellas, Robert C. Vail | 2000-04-11 |