Alferd Cofer — 17 Patents at Tegal

Alferd Cofer has been granted 17 US patents while listed as an inventor at Tegal. The first was granted in 2000 and the most recent in July 2011. Alferd Cofer ranks #263,971 of 4,157,543 US inventors in our database (top 6.3%). Patent records list Alferd Cofer in Petaluma, CA, US.

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
7985688	Notch stop pulsing process for plasma processing system	Tamarak Pandhumsoporn	2011-07-26	$35,580,000
7459100	Methods and apparatus for sequentially alternating among plasma processes in order to optimize a substrate	Adrian Kiermasz, Tamarak Pandhumsoporn	2008-12-02	$23,516,000
7351664	Methods for minimizing mask undercuts and notches for plasma processing system	Tamarak Pandhumsoporn, William Frederick Bosch	2008-04-01	$9,821,000
7223699	Plasma etch reactor and method	Stephen P. DeOrnellas, Leslie G. Jerde, Robert C. Vail, Kurt A. Olson	2007-05-29	$453,000
6958295	Method for using a hard mask for critical dimension growth containment	Stephen P. DeOrnellas, Leslie G. Jerde	2005-10-25	$1,111,000
6951820	Method for using a hard mask for critical dimension growth containment	Stephen P. DeOrnellas, Leslie G. Jerde	2005-10-04	$7,127,000
6905969	Plasma etch reactor and method	Stephen P. DeOrnellas, Leslie G. Jerde, Robert C. Vail, Kurt A. Olson	2005-06-14	$1,116,000
6774046	Method for minimizing the critical dimension growth of a feature on a semiconductor wafer	Stephen P. DeOrnellas, Leslie G. Jerde, Kurt A. Olson, Paritosh Rajora	2004-08-10	$1,193,000
6620335	Plasma etch reactor and method	Stephen P. DeOrnellas, Leslie G. Jerde, Robert C. Vail, Kurt A. Olson	2003-09-16	$837,000
6500314	Plasma etch reactor and method	Stephen P. DeOrnellas, Leslie G. Jerde, Robert C. Vail, Kurt A. Olson	2002-12-31	$236,000
6492280	Method and apparatus for etching a semiconductor wafer with features having vertical sidewalls	Stephen P. DeOrnellas, Paritosh Rajora	2002-12-10	$234,000
6410448	Plasma etch reactor and method for emerging films	Stephen P. DeOrnellas, Robert C. Vail	2002-06-25	$247,000
6354240	Plasma etch reactor having a plurality of magnets	Stephen P. DeOrnellas, Leslie G. Jerde, Robert C. Vail, Kurt A. Olson	2002-03-12	$363,000
6287975	Method for using a hard mask for critical dimension growth containment	Stephen P. DeOrnellas, Leslie G. Jerde	2001-09-11
6190496	Plasma etch reactor and method for emerging films	Stephen P. DeOrnellas, Robert C. Vail	2001-02-20	$1,009,000
6127277	Method and apparatus for etching a semiconductor wafer with features having vertical sidewalls	Stephen P. DeOrnellas, Paritosh Rajora	2000-10-03	$1,477,000
6048435	Plasma etch reactor and method for emerging films	Stephen P. DeOrnellas, Robert C. Vail	2000-04-11	$2,496,000

Alferd Cofer — 17 Patents

Issued Patents All Time

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