Issued Patents All Time
Showing 26–47 of 47 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5680330 | Method of and apparatus for calculating diameter of bundle of electric leads | Takeshi Kunimi | 1997-10-21 |
| 5621497 | Pattern forming method and projection exposure tool therefor | Tsuneo Terasawa, Minoru Toriumi | 1997-04-15 |
| 5557314 | Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus | Yoshihiko Okamoto, Haruo Yoda, Ikuo Takada, Yukinobu Shibata, Akira Hirakawa +2 more | 1996-09-17 |
| 5512328 | Method for forming a pattern and forming a thin film used in pattern formation | Toshiyuki Yoshimura, Naoko Miura, Minoru Toriumi, Hiroshi Shiraishi | 1996-04-30 |
| 5424173 | Electron beam lithography system and method | Hiroaki Wakabayashi, Osamu Suga, Yoshinori Nakayama | 1995-06-13 |
| 5402410 | High density storage of information on a substrate with multiple depth and height | Toshiyuki Yoshimura, Shigeru Kakumoto, Yuji Toda | 1995-03-28 |
| 5334282 | Electron beam lithography system and method | Yoshinori Nakayama | 1994-08-02 |
| 5334845 | Charged beam exposure method and apparatus as well as aperture stop and production method thereof | Hiroaki Wakabayashi, Yoshinori Nakayama, Fumio Murai | 1994-08-02 |
| 5305364 | Projection type X-ray lithography apparatus | Kozo Mochiji, Hiroaki Oizumi, Shigeo Moriyama, Tsuneo Terasawa, Masaaki Itou | 1994-04-19 |
| 5283440 | Electron beam writing system used in a cell projection method | Yasunari Sohda, Hideo Todokoro, Norio Saitou, Haruo Yoda, Hiroyuki Itoh +2 more | 1994-02-01 |
| 5250812 | Electron beam lithography using an aperture having an array of repeated unit patterns | Fumio Murai, Haruo Yoda, Yukinobu Shibata, Akira Tsukizoe | 1993-10-05 |
| 5097138 | Electron beam lithography system and method | Hiroaki Wakabayashi, Osamu Suga, Yoshinori Nakayama | 1992-03-17 |
| 5061599 | Radiation sensitive materials | Tetsuichi Kudo, Akira Ishikawa, Hiroshi Okamoto, Katsuki Miyauchi, Takao Iwayanagi +1 more | 1991-10-29 |
| 4983864 | Electronic beam drawing apparatus | Fumio Murai | 1991-01-08 |
| 4798470 | Pattern printing method and apparatus | Shigeo Moriyama, Toshiei Kurosaki, Tsuneo Terasawa, Yoshio Kawamura | 1989-01-17 |
| 4740693 | Electron beam pattern line width measurement system | Yoshinori Nakayama, Hidehito Obayashi, Mikio Ichihashi | 1988-04-26 |
| 4729965 | Method of forming extrinsic base by diffusion from polysilicon/silicide source and emitter by lithography | Yoichi Tamaki, Kazuhiko Sagara, Norio Hasegawa, Toshihiko Takakura, Hirotaka Nishizawa | 1988-03-08 |
| 4723903 | Stamper for replicating high-density data recording disks | Masaru Ito | 1988-02-09 |
| 4514556 | 4,4'-Methylene-bis-(2-ethyl-5-methyl imidazole) and methods of producing and using the same | Natsuo Sawa, Toshihiro Suzuki | 1985-04-30 |
| 4403151 | Method of forming patterns | Kozo Mochiji, Yozi Maruyama, Fumio Murai | 1983-09-06 |
| 4315984 | Method of producing a semiconductor device | Kozo Mochiji, Susumu Takahashi, Fumio Murai | 1982-02-16 |
| 4307176 | Method of forming a pattern | Kozo Mochiji, Shojiro Asai | 1981-12-22 |