Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6475680 | Lithium secondary battery, its electrolyte, and electric apparatus using the same | Juichi Arai, Hideaki Katayama, Haruo Akahoshi, Tomoe Takamura | 2002-11-05 |
| 5554911 | Light-emitting elements | Takahiro Nakayama, Atsushi Kakuta | 1996-09-10 |
| 5061599 | Radiation sensitive materials | Tetsuichi Kudo, Akira Ishikawa, Hiroshi Okamoto, Katsuki Miyauchi, Fumio Murai +1 more | 1991-10-29 |
| 4985344 | Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer | Shoichi Uchino, Takumi Ueno, Saburo Nonogaki, Michiaki Hashimoto | 1991-01-15 |
| 4983500 | Radiation imaging process for formation of contrast enhanced pattern using two photosensitive dialonium salt layers with removal of overlayer and developed resist pattern in underlayer | Shouichi Uchino, Michiaki Hashimoto | 1991-01-08 |
| 4835089 | Resist pattern forming process with dry etching | Norio Hasegawa, Toshihiko Tanaka, Hiroshi Shiraishi, Takumi Ueno, Michiaki Hashimoto +2 more | 1989-05-30 |
| 4728594 | Photosensitive composition with azide or bisazide compound with oxazolone group | Saburo Nonogaki, Ryotaro Irie, Michiaki Hashimoto | 1988-03-01 |
| 4719161 | Mask for X-ray lithography and process for producing the same | Takeshi Kimura, Kozo Mochiji, Hiroshi Okamoto, Tetsuichi Kudo, Shinji Kuniyoshi | 1988-01-12 |
| 4614706 | Method of forming a microscopic pattern with far UV pattern exposure, alkaline solution development, and dry etching | Toshiharu Matsuzawa, Kikuo Douta, Hiroshi Yanazawa, Takahiro Kohashi, Saburo Nonogaki | 1986-09-30 |
| 4536421 | Method of forming a microscopic pattern | Toshiharu Matsuzawa, Kikuo Douta, Hiroshi Yanazawa | 1985-08-20 |
| 4469778 | Pattern formation method utilizing deep UV radiation and bisazide composition | Takahiro Kohashi, Saburo Nonogaki, Yoshio Hatano | 1984-09-04 |
| 4465768 | Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate | Takumi Ueno, Hiroshi Shiraishi, Takahiro Kohashi, Saburo Nonogaki | 1984-08-14 |
| 4436583 | Selective etching method of polyimide type resin film | Atsushi Saiki, Saburo Nonogaki, Takashi Nishida, Seiki Harada | 1984-03-13 |