Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4614706 | Method of forming a microscopic pattern with far UV pattern exposure, alkaline solution development, and dry etching | Toshiharu Matsuzawa, Takao Iwayanagi, Kikuo Douta, Hiroshi Yanazawa, Saburo Nonogaki | 1986-09-30 |
| 4561169 | Method of manufacturing semiconductor device utilizing multilayer mask | Masaru Miyazaki, Susumu Takahashi, Kiichi Ueyanagi | 1985-12-31 |
| 4520094 | Process for forming powder pattern on light exposed layer having photosensitive diazonium salts | Hajime Morishita, Motoo Akagi, Nobuaki Hayashi, Saburo Nonogaki, Shoichi Uchino | 1985-05-28 |
| 4469778 | Pattern formation method utilizing deep UV radiation and bisazide composition | Takao Iwayanagi, Saburo Nonogaki, Yoshio Hatano | 1984-09-04 |
| 4465768 | Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate | Takumi Ueno, Hiroshi Shiraishi, Takao Iwayanagi, Saburo Nonogaki | 1984-08-14 |
| 4409313 | Powder deposition to form pattern on light imaged photosensitive diazonium salt coating having salt of aromatic amine | Hajime Morishita, Saburo Nonogaki, Motoo Akagi, Nobuaki Hayashi, Shoichi Uchino | 1983-10-11 |
| 4377630 | Photosensitive composition | Hajime Morishita, Saburo Nonogaki, Motoo Akagi, Nobuaki Hayashi, Shoichi Uchino | 1983-03-22 |
| 4241162 | Light sensitive photoresist materials | Yoshio Hatano, Michiaki Hashimoto, Saburo Nonogaki | 1980-12-23 |
| 4191571 | Method of pattern forming in a photosensitive composition having a reciprocity law failing property | Saburo Nonogaki, Yoshio Hatano | 1980-03-04 |