Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6319649 | Photosensitive resin composition and method of forming resist images | Koji Kato, Masahiro Hashimoto, Toshio Sakamizu, Hiroshi Shiraishi | 2001-11-20 |
| 5314783 | Photosensitive quinone diazide and resin composition having high absorbency for a wavelength of 365 nm containing a benzotriazole ultraviolet absorbing compound | Shigeru Koibuchi, Asao Isobe | 1994-05-24 |
| 5290666 | Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt | Shouichi Uchino | 1994-03-01 |
| 5215858 | Photosensitive resin composition and pattern formation using the same | Shigeru Koibuchi, Asao Isobe | 1993-06-01 |
| 5024920 | Process for forming a pattern using a photosensitive azide and a high-molecular weight copolymer or polymer | Hajime Morishita, Nobuaki Hayashi, Saburo Nonogaki, Masato Ito, Masahiro Nishizawa +2 more | 1991-06-18 |
| 4985344 | Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer | Shoichi Uchino, Takumi Ueno, Takao Iwayanagi, Saburo Nonogaki | 1991-01-15 |
| 4983500 | Radiation imaging process for formation of contrast enhanced pattern using two photosensitive dialonium salt layers with removal of overlayer and developed resist pattern in underlayer | Shouichi Uchino, Takao Iwayanagi | 1991-01-08 |
| 4835089 | Resist pattern forming process with dry etching | Takao Iwayanagi, Norio Hasegawa, Toshihiko Tanaka, Hiroshi Shiraishi, Takumi Ueno +2 more | 1989-05-30 |
| 4728594 | Photosensitive composition with azide or bisazide compound with oxazolone group | Saburo Nonogaki, Ryotaro Irie, Takao Iwayanagi | 1988-03-01 |
| 4565768 | Photosensitive azide composition with alkali soluble polymer and process of using to form resist pattern | Saburo Nonogaki | 1986-01-21 |
| 4430400 | Method of producing color filters using dehydrating solution | Toshio Nakano, Yoshio Taniguchi, Ken Tsutsui, Akira Sasano, Tadeo Kaneko +1 more | 1984-02-07 |
| 4412236 | Color solid-state imager | Akira Sasano, Toshio Nakano, Ken Tsutsui, Tadao Kaneko, Norio Koike +1 more | 1983-10-25 |
| 4395629 | Solid-state color imager and method of manufacturing the same | Akira Sasano, Toshio Nakano, Ken Tsutsui, Tadao Kaneko, Yoshio Taniguchi +2 more | 1983-07-26 |
| 4311773 | Method of producing color filters | Tadao Kaneko, Toshio Nakano, Akira Sasano | 1982-01-19 |
| 4285007 | Color solid-state imager and method of making the same | Toshio Nakano, Tadao Kaneko, Yoshio Hatano, Haruo Matsumaru, Akira Sasano +1 more | 1981-08-18 |
| 4273842 | Process for forming patternwise coated powder layer | Saburo Nonogaki, Hajime Morishita, Toshikatsu Manabe, Yoshifumi Tomita, Masahiro Nishizawa | 1981-06-16 |
| 4241162 | Light sensitive photoresist materials | Yoshio Hatano, Takahiro Kohashi, Saburo Nonogaki | 1980-12-23 |