AI

Asao Isobe

HC Hitachi Chemical Company: 9 patents #162 of 1,946Top 9%
HI Hitachi: 7 patents #5,859 of 28,497Top 25%
HI Hitach: 1 patents #1 of 68Top 2%
Overall (All Time): #527,557 of 4,157,543Top 15%
10
Patents All Time

Issued Patents All Time

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
5441849 Method of forming pattern and making semiconductor device using radiation-induced conductive resin bottom resist layer Hiroshi Shiraishi, Takumi Ueno, Fumio Murai, Hajime Hayakawa 1995-08-15
5314783 Photosensitive quinone diazide and resin composition having high absorbency for a wavelength of 365 nm containing a benzotriazole ultraviolet absorbing compound Shigeru Koibuchi, Michiaki Hashimoto 1994-05-24
5215858 Photosensitive resin composition and pattern formation using the same Shigeru Koibuchi, Michiaki Hashimoto 1993-06-01
4801519 Process for producing a pattern with negative-type photosensitive composition Shigeru Koibuchi, Daisuke Makino, Yutaka Takeda 1989-01-31
4722883 Process for producing fine patterns Shigeru Koibuchi, Daisuke Makino 1988-02-02
4698291 Photosensitive composition with 4-azido-2'-methoxychalcone Shigeru Koibuchi, Daisuke Makino 1987-10-06
4554237 Photosensitive resin composition and method for forming fine patterns with said composition Fumio Kataoka, Fusaji Shoji, Hitoshi Yokono, Daisuke Makino, Shigeru Koibuchi 1985-11-19
4513077 Electron beam or X-ray reactive image-formable resinous composition Daisuke Makino, Hiroshi Shiraishi 1985-04-23
4499163 Soldering mask formed from a photosensitive resin composition and a photosensitive element Toshiaki Ishimaru, Katsushige Tsukada, Nobuyuki Hayashi, Shigeru Koibuchi 1985-02-12
4295947 Photo-curable coating compositions for building materials Eiichi Ohtani, Kengo Kobayashi, Shigeyoshi Tanaka 1981-10-20